DOI: 10.7567/jjaps.18s1.109. Determination of Localized State Density Distribution in Glow Discharge Amorphous Silicon

Determination of Localized State Density Distribution in Glow Discharge Amorphous Silicon

10.7567/jjaps.18s1.109

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Bibliography

Hirose, M., Suzuki, T., & Doehler, G. H. (1979). Determination of Localized State Density Distribution in Glow Discharge Amorphous Silicon. Japanese Journal of Applied Physics, 18(S1), 109.

Authors 3

Masataka Hirose (first)
Tohru Suzuki (additional)
Gottfried H. Doehler (additional)

References 0 Referenced 2

None

Dates

Type	When
Created	11 years, 5 months ago (March 11, 2014, 11:17 a.m.)
Deposited	5 years, 2 months ago (May 31, 2020, 6:21 p.m.)
Indexed	1 year, 6 months ago (Feb. 4, 2024, 6 p.m.)
Issued	46 years, 7 months ago (Jan. 1, 1979)
Published	46 years, 7 months ago (Jan. 1, 1979)
Published Online	11 years, 5 months ago (March 11, 2014)
Published Print	46 years, 7 months ago (Jan. 1, 1979)

Funders 0

None

BibTeX

@article{Hirose_1979, title={Determination of Localized State Density Distribution in Glow Discharge Amorphous Silicon}, volume={18}, ISSN={1347-4065}, url={http://dx.doi.org/10.7567/jjaps.18s1.109}, DOI={10.7567/jjaps.18s1.109}, number={S1}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Hirose, Masataka and Suzuki, Tohru and Doehler, Gottfried H.}, year={1979}, month=jan, pages={109} }

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