DOI: 10.3139/147.100310. TEM-Präparation mittels „low-voltage“-FIB

TEM-Präparation mittels „low-voltage“-FIB

10.3139/147.100310

Crossref journal-article

Walter de Gruyter GmbH

Practical Metallography (374)

Abstract

Kurzfassung Die Zielpräparation von elektronentransparenten Querschnitten wird in der Halbleiterindustrie in der Regel mit fokussierten Ga-Ionenstrahlen (FIB) durchgeführt. Es wird am Beispiel von Si und GaAs gezeigt, dass die Reduzierung der Beschleunigungsspannung der Ga-Ionen von 30 kV auf 2 kV „low voltage“ die Schädigung der Probenoberfläche durch die Bestrahlung vermindert bzw. beseitigt. Die stetige Verbesserung der Abbildungsleistung der Ionenquellen auch bei geringen Beschleunigungsspannungen macht die „low voltage“ Politur von elektronentransparenten TEM-Lamellen zu einer praktikablen Methode zur signifikanten Verminderung von Präparationsartefakten.

Bibliography

Altmann, F., Graff, A., Simon, M., Hoffmeister, H., & Gnauck, P. (2006). TEM-PrÃ¤paration mittels âlow-voltageâ-FIB. Practical Metallography, 43(8), 396â405.

Authors 5

Frank Altmann (first)
Andreas Graff (additional)
Michél Simon (additional)
Himar Hoffmeister (additional)
Peter Gnauck (additional)

References 6 Referenced 2

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10.1007/b101190 / Introduction to Focused Ion Beam (2005)
{'key': '2021062305295490640_R3_w2aab3b7b4b1b6b1ab1ab3Aa', 'first-page': '206', 'article-title': 'Prakt. Metallogr.', 'volume': '4', 'year': '2005'} / Prakt. Metallogr. (2005)
{'key': '2021062305295490640_R4_w2aab3b7b4b1b6b1ab1ab4Aa', 'first-page': '109', 'article-title': 'Prakt. Metallogr.', 'volume': '40', 'year': '2003'} / Prakt. Metallogr. (2003)
{'key': '2021062305295490640_R5_w2aab3b7b4b1b6b1ab1ab5Aa', 'first-page': '451', 'article-title': 'Journal of Electron Microscopy', 'volume': '53', 'year': '2004'} / Journal of Electron Microscopy (2004)
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Dates

Type	When
Created	11 years, 8 months ago (Dec. 9, 2013, 11:03 a.m.)
Deposited	4 years, 2 months ago (June 23, 2021, 4:33 p.m.)
Indexed	3 years, 4 months ago (April 4, 2022, 2:32 p.m.)
Issued	19 years ago (Aug. 1, 2006)
Published	19 years ago (Aug. 1, 2006)
Published Online	12 years, 3 months ago (May 9, 2013)
Published Print	19 years ago (Aug. 1, 2006)

Funders 0

None

BibTeX

@article{Altmann_2006, title={TEM-Präparation mittels „low-voltage“-FIB}, volume={43}, ISSN={0032-678X}, url={http://dx.doi.org/10.3139/147.100310}, DOI={10.3139/147.100310}, number={8}, journal={Practical Metallography}, publisher={Walter de Gruyter GmbH}, author={Altmann, Frank and Graff, Andreas and Simon, Michél and Hoffmeister, Himar and Gnauck, Peter}, year={2006}, month=aug, pages={396–405} }

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