DOI: 10.3131/jvsj.15.214. Preparation of A1N Thin Films by Reactive R-F Sputtering and their Properties

Preparation of A1N Thin Films by Reactive R-F Sputtering and their Properties

10.3131/jvsj.15.214

Crossref journal-article

The Vacuum Society of Japan

SHINKU (1694)

Bibliography

ITOH, A., & MISAWA, S. (1972). Preparation of A1N Thin Films by Reactive R-F Sputtering and their Properties. SHINKU, 15(6), 214â221.

Authors 2

Akio ITOH (first)
Shunji MISAWA (additional)

References 0 Referenced 7

None

Dates

Type	When
Created	14 years, 2 months ago (June 9, 2011, 2:47 a.m.)
Deposited	4 years, 3 months ago (May 20, 2021, 8:23 a.m.)
Indexed	1 year, 6 months ago (Feb. 5, 2024, 5:01 a.m.)
Issued	53 years, 7 months ago (Jan. 1, 1972)
Published	53 years, 7 months ago (Jan. 1, 1972)
Published Print	53 years, 7 months ago (Jan. 1, 1972)

Funders 0

None

BibTeX

@article{ITOH_1972, title={Preparation of A1N Thin Films by Reactive R-F Sputtering and their Properties}, volume={15}, ISSN={1880-9413}, url={http://dx.doi.org/10.3131/jvsj.15.214}, DOI={10.3131/jvsj.15.214}, number={6}, journal={SHINKU}, publisher={The Vacuum Society of Japan}, author={ITOH, Akio and MISAWA, Shunji}, year={1972}, pages={214–221} }

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