DOI: 10.2494/photopolymer.11.187. Photo Alignment Materials with High Sensitivity to Near UV Light.

Photo Alignment Materials with High Sensitivity to Near UV Light.

10.2494/photopolymer.11.187

Crossref journal-article

Technical Association of Photopolymers, Japan

Journal of Photopolymer Science and Technology (1347)

Bibliography

Makita, Y., Natsui, T., Kimura, S., Nakata, S., Kimura, M., Matsuki, Y., & Takeuchi, Y. (1998). Photo Alignment Materials with High Sensitivity to Near UV Light. Journal of Photopolymer Science and Technology, 11(2), 187â192.

Authors 7

Yutaka Makita (first)
Toru Natsui (additional)
Shin-ichi Kimura (additional)
Shoichi Nakata (additional)
Masayuki Kimura (additional)
Yasuo Matsuki (additional)
Yasumasa Takeuchi (additional)

References 0 Referenced 40

None

Dates

Type	When
Created	17 years, 4 months ago (April 16, 2008, 12:31 a.m.)
Deposited	4 years, 3 months ago (May 20, 2021, 12:13 p.m.)
Indexed	5 months, 1 week ago (March 22, 2025, 5:06 a.m.)
Issued	27 years, 8 months ago (Jan. 1, 1998)
Published	27 years, 8 months ago (Jan. 1, 1998)
Published Print	27 years, 8 months ago (Jan. 1, 1998)

Funders 0

None

BibTeX

@article{Makita_1998, title={Photo Alignment Materials with High Sensitivity to Near UV Light.}, volume={11}, ISSN={1349-6336}, url={http://dx.doi.org/10.2494/photopolymer.11.187}, DOI={10.2494/photopolymer.11.187}, number={2}, journal={Journal of Photopolymer Science and Technology}, publisher={Technical Association of Photopolymers, Japan}, author={Makita, Yutaka and Natsui, Toru and Kimura, Shin-ichi and Nakata, Shoichi and Kimura, Masayuki and Matsuki, Yasuo and Takeuchi, Yasumasa}, year={1998}, pages={187–192} }

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