Abstract
ABSTRACTA new atomistic scheme for simulating polycrystalline thin film deposition based on a Monte Carlo approach has been developed. Simulations of polycrystalline aluminum deposition and annealing at different temperatures are presented. The time evolution of the film morphology for those temperatures is discussed. During deposition, columnar growth is observed at low temperatures. Grain growth takes place mainly during annealing. Faceting and selection of preferred crystal orientations (texture) is observed.
References
7
Referenced
3
10.1557/S0883769400045619
{'key': 'S1946427400256777_ref006', 'first-page': '6225', 'volume': '23', 'author': 'Gupta', 'year': '1981', 'journal-title': 'Phys. Rev. B'}
/ Phys. Rev. B by Gupta (1981)10.1117/12.48908
10.1080/14786436808227358
10.1109/16.141224
/ IEEE Trans. Elect. Dev. by Goldham (1992)- 7. Huang H. , Gilmer G. , Rubia T. Díaz de la , to be published.
10.1116/1.584901
Dates
Type | When |
---|---|
Created | 14 years, 5 months ago (April 5, 2011, 12:13 p.m.) |
Deposited | 4 years, 6 months ago (Feb. 24, 2021, 4:28 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 7, 2024, 1:04 a.m.) |
Issued | 27 years, 8 months ago (Jan. 1, 1998) |
Published | 27 years, 8 months ago (Jan. 1, 1998) |
Published Online | 14 years, 6 months ago (Feb. 10, 2011) |
Published Print | 27 years, 8 months ago (Jan. 1, 1998) |
@article{Rubio_1998, title={Monte Carlo Atomistic Simulation of Polycrystalline Aluminum Deposition}, volume={514}, ISSN={1946-4274}, url={http://dx.doi.org/10.1557/proc-514-127}, DOI={10.1557/proc-514-127}, journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC}, author={Rubio, J. Emiliano and Jaraíz, Martín and BaiIón, Luis A. and Barbolla, Juan and López, M José and Gilmer, George H.}, year={1998} }