Abstract
AbstractBarrier heights in metal-semiconductor contacts may be modified by interlayers. The effects of atomic interlayers are due to interface dipoles. With the restriction to nearest-neighbor interactions and monovalent interlayer atoms, they may be described as interface molecules which consist of an interlayer and a substrate atom. If the interlayers are thicker than a few atomic layers their two interfaces with the metal and with the semiconductor will be non-interacting. Both types of interfaces are described by the model that interface-induced gap states determine the alignment of the bands and the electronegativity difference describes the charge transfer across the interface. The present paper discusses and analyzes experimental data for H-modified diamond and silicon, Al/Si/GalnP, and metal/ Si3N4/Si Schottky contacts.
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Dates
Type | When |
---|---|
Created | 14 years, 4 months ago (April 5, 2011, 8:08 p.m.) |
Deposited | 4 years, 6 months ago (Feb. 24, 2021, 4:10 p.m.) |
Indexed | 1 year, 7 months ago (Feb. 2, 2024, 3:02 p.m.) |
Issued | 30 years, 8 months ago (Jan. 1, 1995) |
Published | 30 years, 8 months ago (Jan. 1, 1995) |
Published Online | 14 years, 6 months ago (Feb. 26, 2011) |
Published Print | 30 years, 8 months ago (Jan. 1, 1995) |
@article{M_nch_1995, title={Electronic Properties of Ideal and Interface-Modified Metal-Semiconductor Contacts}, volume={378}, ISSN={1946-4274}, url={http://dx.doi.org/10.1557/proc-378-811}, DOI={10.1557/proc-378-811}, journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC}, author={Mönch, Winfried}, year={1995} }