Abstract
ABSTRACTHighly porous silicon, well passivated via an anodic oxidation process, is a stable and efficient visible light emitter showing a 3% photoluminescence efficiency at room temperature. Luminescence decay times are on the order of 100 μs at room temperature and 10 ms at low temperature. Above room temperature the de-excitation is dominated by non-radiative processes well describe by a tunnelling escape of carriers from confined regions. The “anomalous” luminescence behaviour showing a dramatic increase of the lifetimes upon cooling associated with a decrease of the intensity is explained by the temperature dependence of the effective radiative recombination rates due to a population redistribution among two excited states with very different radiative relaxation rates.
References
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Dates
Type | When |
---|---|
Created | 14 years, 5 months ago (March 5, 2011, 8:40 p.m.) |
Deposited | 4 years, 6 months ago (Feb. 24, 2021, 3:53 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 7, 2024, 6:43 p.m.) |
Issued | 33 years, 8 months ago (Jan. 1, 1992) |
Published | 33 years, 8 months ago (Jan. 1, 1992) |
Published Online | 14 years, 6 months ago (Feb. 28, 2011) |
Published Print | 33 years, 8 months ago (Jan. 1, 1992) |
@article{Vial_1992, title={Radiative and Non-Radiative Processes for the light Emission from Porous Silicon}, volume={283}, ISSN={1946-4274}, url={http://dx.doi.org/10.1557/proc-283-241}, DOI={10.1557/proc-283-241}, journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC}, author={Vial, J. C. and Bsiesy, A. and Fishman, G. and Gaspard, F. and Herino, R. and Ligeon, M. and Muller, F. and Romestain, R. and Macfarlane, R. M.}, year={1992} }