Abstract
ABSTRACTIt is generally observed that strain relaxation, which occurs by misfit dislocation formation, in lattice-mismatched heteroepitaxial layers is accompanied by the formation of threading dislocations. However, our group and others have observed that strain-relaxed epitaxial layers of In1−xGaxAs on GaAs substrates can be grown without the formation of threading dislocations in the epitaxial layer. We have been able to grow strain-relaxed layers up to 13% In concentration without observable densities of threading dislocations in the epilayer but do observe a large number of dislocations pushed into the GaAs substrate. The ability to grow strain-relaxed, lattice-mismatched heteroepitaxial layers has important practical applications. We have succeeded in growing dislocation-free layers of ZnSe on appropriately lattice-matched layers of In1−xGaxAs.
References
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Dates
Type | When |
---|---|
Created | 14 years, 5 months ago (March 5, 2011, 7:56 p.m.) |
Deposited | 4 years, 6 months ago (Feb. 24, 2021, 3:11 p.m.) |
Indexed | 3 years, 5 months ago (April 1, 2022, 6:45 p.m.) |
Issued | 33 years, 8 months ago (Jan. 1, 1992) |
Published | 33 years, 8 months ago (Jan. 1, 1992) |
Published Online | 14 years, 6 months ago (Feb. 25, 2011) |
Published Print | 33 years, 8 months ago (Jan. 1, 1992) |
@article{Schowalter_1992, title={Control of threading dislocations in lattice-mismatched heteroepitaxy}, volume={263}, ISSN={1946-4274}, url={http://dx.doi.org/10.1557/proc-263-485}, DOI={10.1557/proc-263-485}, journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC}, author={Schowalter, L.J. and Taylor, A.P. and Petruzzello, J. and Gaines, J. and Olego, D.}, year={1992} }