Abstract
AbstractA method for determining mechanical parameters and residual stresses for thin films is described. Multi-layer cantilever beams (LPCVD SiNx/thermal SiO2) are fabricated utilizing standard IC processing technologies and micromachining of silicon. The elastic response of the beams to imposed deflections is then measured using a Nanoindenter, a sub-micron hardness testing machine. The elastic constants of the nitride films are calculated from the force vs. deflection slope and known elastic constants of the thermal SiO2 and silicon. By measuring the curvature of the multi-layer cantilever beams with a scanning electron microscope after successive etching of the LPCVD nitride films, average and differential stresses in the films were calculated.
References
8
Referenced
13
10.1063/1.1661935
10.1149/1.2113711
10.1149/1.2426719
10.1063/1.339082
10.1557/JMR.1988.0931
10.1063/1.90207
{'key': 'S1946427400418932_ref006', 'first-page': '56', 'volume-title': 'CRC Handbook of Chemistry and Physics', 'author': 'Weast', 'year': '1985'}
/ CRC Handbook of Chemistry and Physics by Weast (1985)- [3] Weihs T. P. , Hong S. , Bravman J. C. and Nix W. D. , These Proceedings.
Dates
Type | When |
---|---|
Created | 14 years, 5 months ago (March 5, 2011, 9:01 p.m.) |
Deposited | 4 years, 5 months ago (Feb. 24, 2021, 3:32 p.m.) |
Indexed | 1 year, 6 months ago (Feb. 11, 2024, 4:56 a.m.) |
Issued | 37 years, 7 months ago (Jan. 1, 1988) |
Published | 37 years, 7 months ago (Jan. 1, 1988) |
Published Online | 14 years, 6 months ago (Feb. 22, 2011) |
Published Print | 37 years, 7 months ago (Jan. 1, 1988) |
@article{Hong_1988, title={The Determination of Mechanical Parameters and Residual Stresses for Thin Films Using Micro-Cantilever Beams}, volume={130}, ISSN={1946-4274}, url={http://dx.doi.org/10.1557/proc-130-93}, DOI={10.1557/proc-130-93}, journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC}, author={Hong, S. and Weihs, T. P. and Bravman, J. C. and Nix, W. D.}, year={1988} }