10.1557/proc-130-77
Crossref journal-article
Springer Science and Business Media LLC
MRS Proceedings (297)
Abstract

AbstractMetal films used as conductors in integrated circuits must be able to withstand stresses created during their deposition, caused by mismatches in thermal expansion coefficients and by bending which occurs during manufacture and installation. These stresses may be biaxial or uniaxial in nature. This paper discusses testing techniques and gives examples of results of mechanical testing of thin metallic films of aluminum, aluminum-copper(2%), copper, and tungsten in uniaxial and biaxial tension. The film specimens were deposited on and removed from production silicon wafers in order to simulate as much as possible actual device conditions. Basic considerations for the comparison of the two testing methods are also presented.

Bibliography

Rosenmayer, C. T., Brotzen, F. R., & Gale, R. J. (1988). Mechanical Testing of Thin Films. MRS Proceedings, 130.

Authors 3
  1. C. T. Rosenmayer (first)
  2. F. R. Brotzen (additional)
  3. R. J. Gale (additional)
References 18 Referenced 20
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Dates
Type When
Created 14 years, 5 months ago (March 5, 2011, 9:01 p.m.)
Deposited 4 years, 5 months ago (Feb. 24, 2021, 3:32 p.m.)
Indexed 1 year, 6 months ago (Feb. 6, 2024, 1:23 a.m.)
Issued 37 years, 7 months ago (Jan. 1, 1988)
Published 37 years, 7 months ago (Jan. 1, 1988)
Published Online 14 years, 6 months ago (Feb. 22, 2011)
Published Print 37 years, 7 months ago (Jan. 1, 1988)
Funders 0

None

@article{Rosenmayer_1988, title={Mechanical Testing of Thin Films}, volume={130}, ISSN={1946-4274}, url={http://dx.doi.org/10.1557/proc-130-77}, DOI={10.1557/proc-130-77}, journal={MRS Proceedings}, publisher={Springer Science and Business Media LLC}, author={Rosenmayer, C. T. and Brotzen, F. R. and Gale, R. J.}, year={1988} }