Abstract
Cross sections through nanoindents on Si, Ge, and GaAs {001} were examined through transmission electron microscopy. A focused ion beam workstation was used to machine electron transparent windows through the indents. In both Si and Ge there was a transformed zone immediately under the indent composed of amorphous material and a mixture of face-centered-cubic and body-centered cubic crystals. Cracking and dislocation generation were also observed around the transformed zone. In GaAs the dominant deformation mechanism was twinning on the {11} planes. The hardness of these materials is discussed in light of these observations and their macroscopic material properties such as phase transformation pressure.
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Dates
Type | When |
---|---|
Created | 17 years, 5 months ago (March 5, 2008, 9:41 p.m.) |
Deposited | 3 years, 11 months ago (Sept. 5, 2021, 5:03 a.m.) |
Indexed | 1 month, 2 weeks ago (July 7, 2025, 8:46 p.m.) |
Issued | 23 years, 8 months ago (Dec. 1, 2001) |
Published | 23 years, 8 months ago (Dec. 1, 2001) |
Published Online | 14 years, 6 months ago (Jan. 31, 2011) |
Published Print | 23 years, 8 months ago (Dec. 1, 2001) |
@article{Lloyd_2001, title={Deformation under nanoindents in Si, Ge, and GaAs examined through transmission electron microscopy}, volume={16}, ISSN={2044-5326}, url={http://dx.doi.org/10.1557/jmr.2001.0461}, DOI={10.1557/jmr.2001.0461}, number={12}, journal={Journal of Materials Research}, publisher={Springer Science and Business Media LLC}, author={Lloyd, S. J. and Molina-Aldareguia, J. M. and Clegg, W. J.}, year={2001}, month=dec, pages={3347–3350} }