DOI: 10.1557/jmr.2001.0387. Chemical sensors based on dielectric response of functionalized mesoporous silica films

Chemical sensors based on dielectric response of functionalized mesoporous silica films

10.1557/jmr.2001.0387

Crossref journal-article

Springer Science and Business Media LLC

Journal of Materials Research (297)

Abstract

Dielectric response of mesoporous silica films was monitored as a function of several gas-phase chemical species. The effects of humidity, ammonia, and methane on dielectric constant and dissipation factor of films subjected to different chemical treatments are described. Dielectric constant and dissipation factor of partially dehydroxylated films were found to be highly sensitive to both water vapor and ammonia in air. The capacitive devices based on mesoporous silica films show potential for use in chemical sensors.

Bibliography

Domansky, K., Liu, J., Wang, L.-Q., Engelhard, M. H., & Baskaran, S. (2001). Chemical sensors based on dielectric response of functionalized mesoporous silica films. Journal of Materials Research, 16(10), 2810â2816.

Authors 5

Karel Domansky (first)
Jun Liu (additional)
Li-Qiong Wang (additional)
Mark H. Engelhard (additional)
Suresh Baskaran (additional)

References 20 Referenced 52

10.1038/359710a0
10.1021/j100881a037
10.1139/v65-170
10.1021/ac970427x
13 Cho C. , Gnade B.E. , and Smith D.M. , U.S. Patent No. 5 504 042 (April 2, 1996).
10.1557/S0883769400033613 / MRS Bulletin by Jin (1997)
{'key': 'S0884291400066140_ref011', 'first-page': '83', 'volume-title': 'Charac-terization and Chemical Modification of the Silica Surface', 'volume': '93', 'author': 'Vansant', 'year': '1995'} / Charac-terization and Chemical Modification of the Silica Surface by Vansant (1995)
10.1002/(SICI)1521-4095(199811)10:16<1380::AID-ADMA1380>3.0.CO;2-8
10.1002/(SICI)1521-4095(200002)12:4<291::AID-ADMA291>3.0.CO;2-P
{'key': 'S0884291400066140_ref008', 'first-page': '105', 'volume-title': 'Low Di-electric Constant Materials II', 'volume': '443', 'author': 'Bruinsma', 'year': '1997'} / Low Di-electric Constant Materials II by Bruinsma (1997)
4 Cernosek R.W. , Bigbie J.R. , Anderson M.T. , Small J.H. , and Sawyer P.S. , Technical Digest of the 1998 Solid-State Sensor and Actuator Workshop, Hilton Head Island, SC (1998), pp. 375–378.
16 Kang U. and Wise K.D. , Technical Digest of the 1998 Solid-State Sensor and Actuator Workshop, Hilton Head Island, SC (1998), pp. 183–186.
10.1016/S0167-2991(98)80984-1
10.1002/j.1538-7305.1966.tb01689.x
10.1039/tf9656101507
10.1016/S0925-4005(97)80122-0
10.1016/S0039-9140(97)00295-6
3 Olson D.H. , Stucky G.D. , and Vartuli J.C. , U.S. Patent No. 5 364 797 (November 15, 1994).
{'key': 'S0884291400066140_ref017', 'first-page': '102', 'volume-title': 'Infrared Spectroscopy in Surface Chemistry', 'author': 'Hair', 'year': '1967'} / Infrared Spectroscopy in Surface Chemistry by Hair (1967)
10.1021/ja00053a020

Dates

Type	When
Created	17 years, 6 months ago (March 5, 2008, 9:40 p.m.)
Deposited	4 years, 6 months ago (Feb. 24, 2021, 3:08 p.m.)
Indexed	1 year ago (Aug. 21, 2024, 9:32 p.m.)
Issued	23 years, 11 months ago (Oct. 1, 2001)
Published	23 years, 11 months ago (Oct. 1, 2001)
Published Online	14 years, 7 months ago (Jan. 31, 2011)
Published Print	23 years, 11 months ago (Oct. 1, 2001)

Funders 0

None

BibTeX

@article{Domansky_2001, title={Chemical sensors based on dielectric response of functionalized mesoporous silica films}, volume={16}, ISSN={2044-5326}, url={http://dx.doi.org/10.1557/jmr.2001.0387}, DOI={10.1557/jmr.2001.0387}, number={10}, journal={Journal of Materials Research}, publisher={Springer Science and Business Media LLC}, author={Domansky, Karel and Liu, Jun and Wang, Li-Qiong and Engelhard, Mark H. and Baskaran, Suresh}, year={2001}, month=oct, pages={2810–2816} }

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