DOI: 10.1557/jmr.1999.0132. Ultraviolet laser-induced formation of thin silicon oxide film from the precursor β-chloroethyl silsesquioxane

Ultraviolet laser-induced formation of thin silicon oxide film from the precursor β-chloroethyl silsesquioxane

10.1557/jmr.1999.0132

Crossref journal-article

Springer Science and Business Media LLC

Journal of Materials Research (297)

Abstract

Formation of silicon oxide thin films from spin-coated β-chloroethyl silsesquioxane (β-cesq) on silicon, NaCl, and quartz was induced by 193 nm laser pulses. The silicon oxide deposition is characterized by ir, uv, ellipsometry, and Rutherford backscattering spectrometry. The silicon oxide films obtained by uv irradiation were found to have much less carbon and chlorine as impurities and have a higher refractive index as compared to those obtained by annealing. The photoinduced oxide films were found to be smooth, without laser-induced microrough or periodic structures.

Bibliography

Sharma, J., Berry, D. H., Composto, R. J., & Dai, H.-L. (1999). Ultraviolet laser-induced formation of thin silicon oxide film from the precursor Î²-chloroethyl silsesquioxane. Journal of Materials Research, 14(3), 990â994.

Authors 4

Jaya Sharma (first)
Donald H. Berry (additional)
Russell J. Composto (additional)
Hai-Lung Dai (additional)

References 14 Referenced 10

10.1063/1.357557
10. McCrackin F. L. , A Fortran Program for Analysis of Ellipsometer Measurements (Natl. Bur. Stand. Tech. Note 479, 1969). (10.6028/NBS.TN.479)
{'key': 'S0884291400048366_ref010', 'first-page': '465', 'volume': '8', 'author': 'Arkles', 'year': '1997', 'journal-title': 'Sol-Gel Sci. Technol.'} / Sol-Gel Sci. Technol. by Arkles (1997)
{'key': 'S0884291400048366_ref008', 'first-page': '653', 'volume': '77', 'author': 'Muisener', 'year': '1997', 'journal-title': 'Polym. Mater. Sci. Eng.'} / Polym. Mater. Sci. Eng. by Muisener (1997)
10.1143/JJAP.28.L1310
10.1016/0040-6090(92)90916-Y
10.1063/1.99291
10.1143/JJAP.26.805
9. (a) Figge L.K. , Ph.D. Dissertation, University of Pennsylvania (1996);
10.1016/0168-583X(89)90476-X
10.1143/JJAP.26.835
{'key': 'S0884291400048366_ref007', 'volume-title': 'Pulsed Laser Deposition of Thin Films', 'author': 'Chrisey', 'year': '1994'} / Pulsed Laser Deposition of Thin Films by Chrisey (1994)
{'key': 'S0884291400048366_ref001', 'volume-title': 'ACS Symposium Series', 'volume': '295', 'author': 'Gupta', 'year': '1986'} / ACS Symposium Series by Gupta (1986)
13. Sharma J. and Dai H. L. , unpublished results.

Dates

Type	When
Created	17 years, 5 months ago (March 5, 2008, 9:25 p.m.)
Deposited	4 years, 5 months ago (Feb. 24, 2021, 5:09 p.m.)
Indexed	1 year, 11 months ago (Sept. 3, 2023, 2:43 p.m.)
Issued	26 years, 5 months ago (March 1, 1999)
Published	26 years, 5 months ago (March 1, 1999)
Published Online	14 years, 6 months ago (Jan. 31, 2011)
Published Print	26 years, 5 months ago (March 1, 1999)

Funders 0

None

BibTeX

@article{Sharma_1999, title={Ultraviolet laser-induced formation of thin silicon oxide film from the precursor β-chloroethyl silsesquioxane}, volume={14}, ISSN={2044-5326}, url={http://dx.doi.org/10.1557/jmr.1999.0132}, DOI={10.1557/jmr.1999.0132}, number={3}, journal={Journal of Materials Research}, publisher={Springer Science and Business Media LLC}, author={Sharma, Jaya and Berry, Donald H. and Composto, Russell J. and Dai, Hai-Lung}, year={1999}, month=mar, pages={990–994} }

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