DOI: 10.1557/jmr.1995.1889. Heat conduction in silicon thin films: Effect of microstructure

Heat conduction in silicon thin films: Effect of microstructure

10.1557/jmr.1995.1889

Crossref journal-article

Springer Science and Business Media LLC

Journal of Materials Research (297)

Abstract

A study was made of the thermal properties of low pressure chemical vapor deposition (LPCVD) silicon thin films with amorphous and polycrystalline microstructures, produced by varying the substrate temperature. Thermal diffusivity measurements were conducted using a thermal wave technique. The thermal diffusivity of the polycrystalline films was found to be about three times that of the amorphous films, but about one eighth that of bulk silicon single crystals. There was also an indication that the diffusivity increased with deposition temperature above the transition temperature from the amorphous to the polycrystalline state. The relationships between the thermal properties and microstructural features, such as grain size and grain boundary, are discussed.

Bibliography

Wei, L., Vaudin, M., Hwang, C. S., White, G., Xu, J., & Steckl, A. J. (1995). Heat conduction in silicon thin films: Effect of microstructure. Journal of Materials Research, 10(8), 1889â1896.

Authors 6

Lanhua Wei (first)
Mark Vaudin (additional)
Cheol Song Hwang (additional)
Grady White (additional)
Jason Xu (additional)
Andrew J. Steckl (additional)

References 35 Referenced 36

10.1557/JMR.1990.1591
10.1063/1.337642
{'key': 'S0884291400078821_ref033', 'volume-title': 'Introduction to Percolation Theory', 'author': 'Stauffer', 'year': '1992'} / Introduction to Percolation Theory by Stauffer (1992)
10.1016/0040-6090(93)90668-F
10.1007/978-1-4613-1893-4_31
{'key': 'S0884291400078821_ref008', 'first-page': '77', 'volume': '3', 'author': 'Graebner', 'year': '1993', 'journal-title': 'Diamond Films Technol.'} / Diamond Films Technol. by Graebner (1993)
10.1016/0040-6031(93)80426-B
{'key': 'S0884291400078821_ref017', 'first-page': '211', 'volume-title': 'Silicon-Based Optoelectronic Materials', 'volume': '298', 'author': 'Steckl', 'year': '1993'} / Silicon-Based Optoelectronic Materials by Steckl (1993)
{'key': 'S0884291400078821_ref021', 'volume-title': 'CRC Handbook of Chemistry and Physics', 'author': 'Weast', 'year': '1986'} / CRC Handbook of Chemistry and Physics by Weast (1986)
10.1088/0950-7671/34/12/303
10.1016/0040-6090(87)90462-7
{'key': 'S0884291400078821_ref023', 'first-page': '666', 'volume-title': 'Handbook of Semiconductor Silicon Technology', 'author': "O'Mara", 'year': '1990'} / Handbook of Semiconductor Silicon Technology by O'Mara (1990)
{'key': 'S0884291400078821_ref025', 'volume-title': 'Introduction to Solid State Physics', 'author': 'Kittel', 'year': '1988'} / Introduction to Solid State Physics by Kittel (1988)
10.1103/PhysRevB.42.1104
10.1116/1.573866
10.1109/SOLSEN.1988.26429
10.1116/1.1312732
{'key': 'S0884291400078821_ref001', 'volume-title': 'Amorphous and Microcrystalline Semiconductor Devices, Vol. II: Materials and Device Physics', 'author': 'Kanicki', 'year': '1992'} / Amorphous and Microcrystalline Semiconductor Devices, Vol. II: Materials and Device Physics by Kanicki (1992)
{'key': 'S0884291400078821_ref016', 'volume-title': 'Photoacoustic and Thermal Wave Phenomena in Semiconductors', 'author': 'Favro', 'year': '1987'} / Photoacoustic and Thermal Wave Phenomena in Semiconductors by Favro (1987)
{'key': 'S0884291400078821_ref002', 'volume-title': 'Polysilicon Thin Films and Interfaces', 'volume': '182', 'author': 'Kamins', 'year': '1990'} / Polysilicon Thin Films and Interfaces by Kamins (1990)
{'key': 'S0884291400078821_ref004', 'first-page': '79', 'volume-title': 'Proceedings of the U.S.-Australia Joint Seminar on Enhanced Thermal Conductance in Microelectronics', 'author': 'Filk', 'year': '1992'} / Proceedings of the U.S.-Australia Joint Seminar on Enhanced Thermal Conductance in Microelectronics by Filk (1992)
{'key': 'S0884291400078821_ref007', 'first-page': '21', 'volume-title': 'Thin-Film Heat Transfer–Properties and Processing', 'volume': '184', 'author': 'Lambropoulous', 'year': '1991'} / Thin-Film Heat Transfer–Properties and Processing by Lambropoulous (1991)
10.1007/BF00635187
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{'key': 'S0884291400078821_ref027', 'first-page': '199', 'volume-title': 'Polysilicon Films and Interfaces', 'volume': '106', 'author': 'Kasmerski', 'year': '1988'} / Polysilicon Films and Interfaces by Kasmerski (1988)
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{'key': 'S0884291400078821_ref022', 'volume-title': 'Elements of X-Ray Diffraction', 'author': 'Cullity', 'year': '1967'} / Elements of X-Ray Diffraction by Cullity (1967)
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10.1063/1.346852
10.1080/01418619308207142
20 Wei L. , Ph. D. Dissertation, Wayne State University, Detroit, MI (1992).

Dates

Type	When
Created	17 years, 11 months ago (Sept. 27, 2007, 8:25 a.m.)
Deposited	4 years, 6 months ago (Feb. 24, 2021, 4:56 p.m.)
Indexed	2 months, 1 week ago (June 24, 2025, 12:30 p.m.)
Issued	30 years, 1 month ago (Aug. 1, 1995)
Published	30 years, 1 month ago (Aug. 1, 1995)
Published Online	14 years, 6 months ago (March 3, 2011)
Published Print	30 years, 1 month ago (Aug. 1, 1995)

Funders 0

None

BibTeX

@article{Wei_1995, title={Heat conduction in silicon thin films: Effect of microstructure}, volume={10}, ISSN={2044-5326}, url={http://dx.doi.org/10.1557/jmr.1995.1889}, DOI={10.1557/jmr.1995.1889}, number={8}, journal={Journal of Materials Research}, publisher={Springer Science and Business Media LLC}, author={Wei, Lanhua and Vaudin, Mark and Hwang, Cheol Song and White, Grady and Xu, Jason and Steckl, Andrew J.}, year={1995}, month=aug, pages={1889–1896} }

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