Abstract
Electron emission from chemical vapor deposited (CVD) diamond and amorphous carbon (a-C) films was observed with a simple field emission device (FED). Both diamond and a-C films were prepared with microwave plasma-enhanced CVD techniques. Electron emission in the ficld strength range + 10 to −10 MVm−1 was studied, and the field emission source was confirmed by a diode characteristic of the I-V curve, a straight line in the Fowler-Nordheim (F-N) plot, and direct observation of light emission from a fluorescent screen. The turn-on field strength was ∼5 MVm−1, which was similar for both kinds of carbon films. The highest current density for diamond films, observed at a field strength of 10 MVm−1, was ∼15 μA cm−2. Diamond films yielded a higher emission current than a-C films. The reasons for the observed field emission are discussed.
References
13
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Dates
Type | When |
---|---|
Created | 17 years, 11 months ago (Sept. 27, 2007, 8:25 a.m.) |
Deposited | 4 years, 6 months ago (Feb. 24, 2021, 4:55 p.m.) |
Indexed | 2 months, 2 weeks ago (June 17, 2025, 5:47 a.m.) |
Issued | 30 years, 2 months ago (July 1, 1995) |
Published | 30 years, 2 months ago (July 1, 1995) |
Published Online | 14 years, 6 months ago (March 3, 2011) |
Published Print | 30 years, 2 months ago (July 1, 1995) |
@article{Feng_1995, title={Electron emission from chemical vapor deposited diamond and amorphous carbon films observed with a simple field emission device}, volume={10}, ISSN={2044-5326}, url={http://dx.doi.org/10.1557/jmr.1995.1585}, DOI={10.1557/jmr.1995.1585}, number={7}, journal={Journal of Materials Research}, publisher={Springer Science and Business Media LLC}, author={Feng, Z. and Brown, I.G. and Ager, J.W.}, year={1995}, month=jul, pages={1585–1588} }