DOI: 10.1364/ol.23.001745. Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures

Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures

10.1364/ol.23.001745

Crossref journal-article

Optica Publishing Group

Optics Letters (285)

Bibliography

Witzgall, G., Vrijen, R., Yablonovitch, E., Doan, V., & Schwartz, B. J. (1998). Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures. Optics Letters, 23(22), 1745.

Authors 5

George Witzgall (first)
Rutger Vrijen (additional)
Eli Yablonovitch (additional)
Vinh Doan (additional)
Benjamin J. Schwartz (additional)

References 3 Referenced 143

10.1117/12.130367 / Proc. SPIE by Wu (1992)
10.1364/OL.22.000132 / Opt. Lett. by Maruo (1997)
10.1016/S0924-4247(98)80055-1 / Sensors Actuators A by Despont (1998)

Dates

Type	When
Created	17 years, 3 months ago (May 7, 2008, 2:51 p.m.)
Deposited	1 year, 1 month ago (July 18, 2024, 4:33 p.m.)
Indexed	1 hour, 8 minutes ago (Sept. 4, 2025, 4:52 a.m.)
Issued	26 years, 9 months ago (Nov. 15, 1998)
Published	26 years, 9 months ago (Nov. 15, 1998)
Published Online	26 years, 9 months ago (Nov. 15, 1998)
Published Print	26 years, 9 months ago (Nov. 15, 1998)

Funders 0

None

BibTeX

@article{Witzgall_1998, title={Single-shot two-photon exposure of commercial photoresist for the production of three-dimensional structures}, volume={23}, ISSN={1539-4794}, url={http://dx.doi.org/10.1364/ol.23.001745}, DOI={10.1364/ol.23.001745}, number={22}, journal={Optics Letters}, publisher={Optica Publishing Group}, author={Witzgall, George and Vrijen, Rutger and Yablonovitch, Eli and Doan, Vinh and Schwartz, Benjamin J.}, year={1998}, month=nov, pages={1745} }

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