Abstract
Abstract Mesoporous silica SBA-15 and SBA-16 films can be successfully prepared on a substrate by a simple method involving a rapid heating process, which is controlled by a voltage applied to a heating electrode on the substrate. This advantageous method has considerable potential for electronic device fabrication processes.
References
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{'key': '2024011922120478200_r17'}
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Dates
Type | When |
---|---|
Created | 20 years, 6 months ago (Feb. 7, 2005, 1:05 a.m.) |
Deposited | 1 year, 7 months ago (Jan. 19, 2024, 5:12 p.m.) |
Indexed | 1 year, 7 months ago (Jan. 19, 2024, 7:01 p.m.) |
Issued | 20 years, 6 months ago (Feb. 5, 2005) |
Published | 20 years, 6 months ago (Feb. 5, 2005) |
Published Online | 20 years, 6 months ago (Feb. 5, 2005) |
Published Print | 20 years, 5 months ago (March 1, 2005) |
@article{Yamada_2005, title={A Simple Method for Fabrication of Mesoporous Films Using a Rapid Heating Process}, volume={34}, ISSN={1348-0715}, url={http://dx.doi.org/10.1246/cl.2005.328}, DOI={10.1246/cl.2005.328}, number={3}, journal={Chemistry Letters}, publisher={Oxford University Press (OUP)}, author={Yamada, Takeo and Zhou, Haoshen and Honma, Itaru and Ueno, Yuko and Horiuchi, Tsutomu and Niwa, Osamu}, year={2005}, month=feb, pages={328–329} }