DOI: 10.1155/tsm.14-18.543. Texture Development in Thin Metallic Films

Texture Development in Thin Metallic Films

10.1155/tsm.14-18.543

Crossref journal-article

Wiley

Texture, Stress, and Microstructure (311)

Abstract

Aluminum films 1μm in thickness are deposited on SiO2/Si(100) by the self‐ion assisted PIB technique and by sputtering. Texture analysis of the four deposition conditions reveals an {111} texture component superimposed on a random grain distribution. The relative fraction of the two components depends strongly on deposition conditions. Annealing at 400°C for 0.5 hr sharpens the {111} texture component at the expense of the random while inducing substantial grain growth where mean grain size increases by a factor of 3.5 to 5. One condition is truly a fiber texture, and the other three have textures with some deviation from axial symmetry.

Bibliography

Knorr, D. B., Tracy, D. P., & Lu, T.-M. (1991). Texture Development in Thin Metallic Films. Texture, Stress, and Microstructure, 14(1), 543â554. Portico.

Authors 3

D. B. Knorr (first)
D. P. Tracy (additional)
T.-M. Lu (additional)

References 0 Referenced 10

None

Dates

Type	When
Created	17 years, 4 months ago (April 21, 2008, 5:29 p.m.)
Deposited	1 year, 2 months ago (June 6, 2024, 5:13 p.m.)
Indexed	1 year, 1 month ago (July 26, 2024, 10:59 p.m.)
Issued	34 years, 7 months ago (Jan. 1, 1991)
Published	34 years, 7 months ago (Jan. 1, 1991)
Published Online	34 years, 7 months ago (Jan. 1, 1991)
Published Print	34 years, 7 months ago (Jan. 1, 1991)

Funders 0

None

BibTeX

@article{Knorr_1991, title={Texture Development in Thin Metallic Films}, volume={14}, ISSN={1687-5400}, url={http://dx.doi.org/10.1155/tsm.14-18.543}, DOI={10.1155/tsm.14-18.543}, number={1}, journal={Texture, Stress, and Microstructure}, publisher={Wiley}, author={Knorr, D. B. and Tracy, D. P. and Lu, T.-M.}, year={1991}, month=jan, pages={543–554} }

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