DOI: 10.1149/1.2905749. Improvement on the Diffusion Barrier Performance of Reactively Sputtered Ru

Improvement on the Diffusion Barrier Performance of Reactively Sputtered Ru–N Film by Incorporation of Ta

10.1149/1.2905749

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Chen, C.-W., Chen, J. S., & Jeng, J.-S. (2008). Improvement on the Diffusion Barrier Performance of Reactively Sputtered RuâN Film by Incorporation of Ta. Journal of The Electrochemical Society, 155(6), H438.

Authors 3

Chun-Wei Chen (first)
J. S. Chen (additional)
Jiann-Shing Jeng (additional)

References 20 Referenced 30

10.1007/BF00617708
10.1149/1.2108827
10.1149/1.1531974
10.1016/S0921-5107(01)00618-3
10.1116/1.588818
10.1149/1.1393594
10.1063/1.349594
International Technology Roadmap for Semiconductors-2006 Updates, http://www.itrs.net/Links/2006Update/FinalToPost/09_Interconnect2006Update.pdf (last accessed on April 10, 2008).
Binary Alloy Phase Diagrams, 2nd ed., T. B. Massalski , Editor-in-Chief, p. 1467, AMS International, Materials Park, OH (1990).
10.1063/1.1610256
10.1149/1.1565138
10.1149/1.2039939
10.1149/1.2188328
M. Thompson and L. Doolittle , RUMP-RBS Analysis and Simulation Package [v 4.00 (beta)], Computer Graphic Service, Ltd. (Feb. 7, 2008).
10.1063/1.2167610
10.1063/1.2435979
10.1007/s00339-004-3182-0
10.1149/1.2069261
10.1016/S0040-6090(02)00342-5
10.1149/1.2168389

Dates

Type	When
Created	17 years, 4 months ago (May 4, 2008, 4:09 a.m.)
Deposited	5 years, 7 months ago (Jan. 13, 2020, 8:39 a.m.)
Indexed	1 year, 3 months ago (June 4, 2024, 12:27 a.m.)
Issued	17 years, 8 months ago (Jan. 1, 2008)
Published	17 years, 8 months ago (Jan. 1, 2008)
Published Print	17 years, 8 months ago (Jan. 1, 2008)

Funders 0

None

BibTeX

@article{Chen_2008, title={Improvement on the Diffusion Barrier Performance of Reactively Sputtered Ru–N Film by Incorporation of Ta}, volume={155}, ISSN={0013-4651}, url={http://dx.doi.org/10.1149/1.2905749}, DOI={10.1149/1.2905749}, number={6}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Chen, Chun-Wei and Chen, J. S. and Jeng, Jiann-Shing}, year={2008}, pages={H438} }

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