DOI: 10.1149/1.2426211. Rates of Formation of Thermal Oxides of Silicon

Rates of Formation of Thermal Oxides of Silicon

10.1149/1.2426211

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Evitts, H. C., Cooper, H. W., & Flaschen, S. S. (1964). Rates of Formation of Thermal Oxides of Silicon. Journal of The Electrochemical Society, 111(6), 688.

Authors 3

H. C. Evitts (first)
H. W. Cooper (additional)
S. S. Flaschen (additional)

References 0 Referenced 30

None

Dates

Type	When
Created	18 years, 4 months ago (March 28, 2007, 11:43 a.m.)
Deposited	5 years, 7 months ago (Jan. 13, 2020, 8:56 a.m.)
Indexed	1 year, 6 months ago (Feb. 6, 2024, 10:29 a.m.)
Issued	61 years, 7 months ago (Jan. 1, 1964)
Published	61 years, 7 months ago (Jan. 1, 1964)
Published Print	61 years, 7 months ago (Jan. 1, 1964)

Funders 0

None

BibTeX

@article{Evitts_1964, title={Rates of Formation of Thermal Oxides of Silicon}, volume={111}, ISSN={0013-4651}, url={http://dx.doi.org/10.1149/1.2426211}, DOI={10.1149/1.2426211}, number={6}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Evitts, H. C. and Cooper, H. W. and Flaschen, S. S.}, year={1964}, pages={688} }

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