DOI: 10.1149/1.2129678. The Chemical Deposition of Boron‐Nitrogen Films

The Chemical Deposition of Boron‐Nitrogen Films

10.1149/1.2129678

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Adams, A. C., & Capio, C. D. (1980). The Chemical Deposition of BoronâNitrogen Films. Journal of The Electrochemical Society, 127(2), 399â405.

Authors 2

A. C. Adams (first)
C. D. Capio (additional)

References 0 Referenced 82

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 4:57 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 12:14 p.m.)
Indexed	1 year, 1 month ago (July 31, 2024, 4:29 p.m.)
Issued	45 years, 7 months ago (Feb. 1, 1980)
Published	45 years, 7 months ago (Feb. 1, 1980)
Published Online	5 years, 8 months ago (Dec. 9, 2019)
Published Print	45 years, 7 months ago (Feb. 1, 1980)

Funders 0

None

BibTeX

@article{Adams_1980, title={The Chemical Deposition of Boron‐Nitrogen Films}, volume={127}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2129678}, DOI={10.1149/1.2129678}, number={2}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Adams, A. C. and Capio, C. D.}, year={1980}, month=feb, pages={399–405} }

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