DOI: 10.1149/1.2129171. The Deposition of Silicon Dioxide Films at Reduced Pressure

The Deposition of Silicon Dioxide Films at Reduced Pressure

10.1149/1.2129171

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Adams, A. C., & Capio, C. D. (1979). The Deposition of Silicon Dioxide Films at Reduced Pressure. Journal of The Electrochemical Society, 126(6), 1042â1046.

Authors 2

A. C. Adams (first)
C. D. Capio (additional)

References 0 Referenced 98

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 4:57 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 11:46 a.m.)
Indexed	4 weeks ago (Aug. 7, 2025, 5:03 p.m.)
Issued	46 years, 3 months ago (June 1, 1979)
Published	46 years, 3 months ago (June 1, 1979)
Published Online	5 years, 8 months ago (Dec. 9, 2019)
Published Print	46 years, 3 months ago (June 1, 1979)

Funders 0

None

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