DOI: 10.1149/1.2128790. Properties of Plasma‐Deposited Silicon Nitride

Properties of Plasma‐Deposited Silicon Nitride

10.1149/1.2128790

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Stein, H. J., Wells, V. A., & Hampy, R. E. (1979). Properties of PlasmaâDeposited Silicon Nitride. Journal of The Electrochemical Society, 126(10), 1750â1754.

Authors 3

H. J. Stein (first)
V. A. Wells (additional)
R. E. Hampy (additional)

References 0 Referenced 101

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 4:57 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 11:37 a.m.)
Indexed	1 week, 2 days ago (Aug. 28, 2025, 8:25 a.m.)
Issued	45 years, 11 months ago (Oct. 1, 1979)
Published	45 years, 11 months ago (Oct. 1, 1979)
Published Online	5 years, 8 months ago (Dec. 9, 2019)
Published Print	45 years, 11 months ago (Oct. 1, 1979)

Funders 0

None

BibTeX

@article{Stein_1979, title={Properties of Plasma‐Deposited Silicon Nitride}, volume={126}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2128790}, DOI={10.1149/1.2128790}, number={10}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Stein, H. J. and Wells, V. A. and Hampy, R. E.}, year={1979}, month=oct, pages={1750–1754} }

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