DOI: 10.1149/1.2119904. Low Pressure Nitrided‐Oxide as a Thin Gate Dielectric for MOSFET's

Low Pressure Nitrided‐Oxide as a Thin Gate Dielectric for MOSFET's

10.1149/1.2119904

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Wong, S. S., Sodini, C. G., Ekstedt, T. W., Grinolds, H. R., Jackson, K. H., Kwan, S. H., & Oldham, W. G. (1983). Low Pressure NitridedâOxide as a Thin Gate Dielectric for MOSFETâs. Journal of The Electrochemical Society, 130(5), 1139â1144.

Authors 7

S. S. Wong (first)
C. G. Sodini (additional)
T. W. Ekstedt (additional)
H. R. Grinolds (additional)
K. H. Jackson (additional)
S. H. Kwan (additional)
W. G. Oldham (additional)

References 0 Referenced 61

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 3:01 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 12:48 p.m.)
Indexed	1 year, 1 month ago (July 5, 2024, 12:40 p.m.)
Issued	42 years, 3 months ago (May 1, 1983)
Published	42 years, 3 months ago (May 1, 1983)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	42 years, 3 months ago (May 1, 1983)

Funders 0

None

BibTeX

@article{Wong_1983, title={Low Pressure Nitrided‐Oxide as a Thin Gate Dielectric for MOSFET’s}, volume={130}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2119904}, DOI={10.1149/1.2119904}, number={5}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Wong, S. S. and Sodini, C. G. and Ekstedt, T. W. and Grinolds, H. R. and Jackson, K. H. and Kwan, S. H. and Oldham, W. G.}, year={1983}, month=may, pages={1139–1144} }

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