DOI: 10.1149/1.2115715. Analysis of Chemical Vapor Deposition of Boron

Analysis of Chemical Vapor Deposition of Boron

10.1149/1.2115715

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Michaelidis, M., & Pollard, R. (1984). Analysis of Chemical Vapor Deposition of Boron. Journal of The Electrochemical Society, 131(4), 860â868.

Authors 2

Maria Michaelidis (first)
Richard Pollard (additional)

References 0 Referenced 31

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 2:51 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 12:53 p.m.)
Indexed	1 year, 6 months ago (Feb. 2, 2024, 8:18 p.m.)
Issued	41 years, 4 months ago (April 1, 1984)
Published	41 years, 4 months ago (April 1, 1984)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	41 years, 4 months ago (April 1, 1984)

Funders 0

None

BibTeX

@article{Michaelidis_1984, title={Analysis of Chemical Vapor Deposition of Boron}, volume={131}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2115715}, DOI={10.1149/1.2115715}, number={4}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Michaelidis, Maria and Pollard, Richard}, year={1984}, month=apr, pages={860–868} }

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