DOI: 10.1149/1.2100544. The Evolution of Si / SiO2 Interface Roughness

The Evolution of Si / SiO2 Interface Roughness

10.1149/1.2100544

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Carim, A. H., & Sinclair, R. (1987). The Evolution of Siâ/âSiO2 Interface Roughness. Journal of The Electrochemical Society, 134(3), 741â746.

Authors 2

A. H. Carim (first)
R. Sinclair (additional)

References 0 Referenced 79

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 2:33 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 1:11 p.m.)
Indexed	1 month, 1 week ago (July 27, 2025, 3:20 a.m.)
Issued	38 years, 6 months ago (March 1, 1987)
Published	38 years, 6 months ago (March 1, 1987)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	38 years, 6 months ago (March 1, 1987)

Funders 0

None

BibTeX

@article{Carim_1987, title={The Evolution of Si / SiO2 Interface Roughness}, volume={134}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2100544}, DOI={10.1149/1.2100544}, number={3}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Carim, A. H. and Sinclair, R.}, year={1987}, month=mar, pages={741–746} }

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