DOI: 10.1149/1.2100239. The Effect of Low Pressure on the Structure of LPCVD Polycrystalline Silicon Films

The Effect of Low Pressure on the Structure of LPCVD Polycrystalline Silicon Films

10.1149/1.2100239

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Joubert, P., Loisel, B., Chouan, Y., & Haji, L. (1987). The Effect of Low Pressure on the Structure of LPCVD Polycrystalline Silicon Films. Journal of The Electrochemical Society, 134(10), 2541â2545.

Authors 4

P. Joubert (first)
B. Loisel (additional)
Y. Chouan (additional)
L. Haji (additional)

References 0 Referenced 154

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 2:33 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 1:09 p.m.)
Indexed	2 months, 1 week ago (June 25, 2025, 5:25 p.m.)
Issued	37 years, 11 months ago (Oct. 1, 1987)
Published	37 years, 11 months ago (Oct. 1, 1987)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	37 years, 11 months ago (Oct. 1, 1987)

Funders 0

None

BibTeX

@article{Joubert_1987, title={The Effect of Low Pressure on the Structure of LPCVD Polycrystalline Silicon Films}, volume={134}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2100239}, DOI={10.1149/1.2100239}, number={10}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Joubert, P. and Loisel, B. and Chouan, Y. and Haji, L.}, year={1987}, month=oct, pages={2541–2545} }

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