DOI: 10.1149/1.2097461. On the Dynamics of an Isothermal Radial‐Flow Plasma Etcher

On the Dynamics of an Isothermal Radial‐Flow Plasma Etcher

10.1149/1.2097461

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Venkatesan, S. P., Edgar, T. F., & Trachtenberg, I. (1989). On the Dynamics of an Isothermal RadialâFlow Plasma Etcher. Journal of The Electrochemical Society, 136(9), 2532â2545.

Authors 3

Suresh P. Venkatesan (first)
Thomas F. Edgar (additional)
Isaac Trachtenberg (additional)

References 0 Referenced 4

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 12:33 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 1:40 p.m.)
Indexed	3 years, 4 months ago (March 31, 2022, 1:52 a.m.)
Issued	35 years, 11 months ago (Sept. 1, 1989)
Published	35 years, 11 months ago (Sept. 1, 1989)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	35 years, 11 months ago (Sept. 1, 1989)

Funders 0

None

BibTeX

@article{Venkatesan_1989, title={On the Dynamics of an Isothermal Radial‐Flow Plasma Etcher}, volume={136}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2097461}, DOI={10.1149/1.2097461}, number={9}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Venkatesan, Suresh P. and Edgar, Thomas F. and Trachtenberg, Isaac}, year={1989}, month=sep, pages={2532–2545} }

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