DOI: 10.1149/1.2097155. The Origin of Nonuniform Growth of LPCVD Films from Silane Gas Mixtures

The Origin of Nonuniform Growth of LPCVD Films from Silane Gas Mixtures

10.1149/1.2097155

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Yeckel, A., Middleman, S., & Hochberg, A. K. (1989). The Origin of Nonuniform Growth of LPCVD Films from Silane Gas Mixtures. Journal of The Electrochemical Society, 136(7), 2038â2050.

Authors 3

Andrew Yeckel (first)
Stanley Middleman (additional)
Arthur K. Hochberg (additional)

References 0 Referenced 22

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 12:33 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 1:38 p.m.)
Indexed	1 year, 10 months ago (Oct. 29, 2023, 10:45 a.m.)
Issued	36 years, 2 months ago (July 1, 1989)
Published	36 years, 2 months ago (July 1, 1989)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	36 years, 2 months ago (July 1, 1989)

Funders 0

None

BibTeX

@article{Yeckel_1989, title={The Origin of Nonuniform Growth of LPCVD Films from Silane Gas Mixtures}, volume={136}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2097155}, DOI={10.1149/1.2097155}, number={7}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Yeckel, Andrew and Middleman, Stanley and Hochberg, Arthur K.}, year={1989}, month=jul, pages={2038–2050} }

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