DOI: 10.1149/1.2096427. Thermodynamics of the Si‐N‐O System and Kinetic Modeling of Oxidation of Si3 N 4

Thermodynamics of the Si‐N‐O System and Kinetic Modeling of Oxidation of Si3 N 4

10.1149/1.2096427

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Du, H., Tressler, R. E., & Spear, K. E. (1989). Thermodynamics of the SiâNâO System and Kinetic Modeling of Oxidation of Si3âNâ4. Journal of The Electrochemical Society, 136(11), 3210â3215.

Authors 3

Honghua Du (first)
Richard E. Tressler (additional)
Karl E. Spear (additional)

References 0 Referenced 90

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 12:33 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 1:29 p.m.)
Indexed	2 months, 2 weeks ago (June 17, 2025, 5:46 a.m.)
Issued	35 years, 10 months ago (Nov. 1, 1989)
Published	35 years, 10 months ago (Nov. 1, 1989)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	35 years, 10 months ago (Nov. 1, 1989)

Funders 0

None

BibTeX

@article{Du_1989, title={Thermodynamics of the Si‐N‐O System and Kinetic Modeling of Oxidation of Si3 N 4}, volume={136}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2096427}, DOI={10.1149/1.2096427}, number={11}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Du, Honghua and Tressler, Richard E. and Spear, Karl E.}, year={1989}, month=nov, pages={3210–3215} }

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