DOI: 10.1149/1.2085441. Atmospheric Pressure Chemical Vapor Deposition of Copper Thin Films: I . Horizontal Hot Wall Reactor

Atmospheric Pressure Chemical Vapor Deposition of Copper Thin Films: I . Horizontal Hot Wall Reactor

10.1149/1.2085441

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Lai, W. G., Xie, Y., & Griffin, G. L. (1991). Atmospheric Pressure Chemical Vapor Deposition of Copper Thin Films: I . Horizontal Hot Wall Reactor. Journal of The Electrochemical Society, 138(11), 3499â3504.

Authors 3

W. G. Lai (first)
Y. Xie (additional)
G. L. Griffin (additional)

References 0 Referenced 50

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 11:18 a.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 1:58 p.m.)
Indexed	1 year, 6 months ago (Feb. 3, 2024, 12:26 a.m.)
Issued	33 years, 9 months ago (Nov. 1, 1991)
Published	33 years, 9 months ago (Nov. 1, 1991)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	33 years, 9 months ago (Nov. 1, 1991)

Funders 0

None

BibTeX

@article{Lai_1991, title={Atmospheric Pressure Chemical Vapor Deposition of Copper Thin Films: I . Horizontal Hot Wall Reactor}, volume={138}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2085441}, DOI={10.1149/1.2085441}, number={11}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Lai, W. G. and Xie, Y. and Griffin, G. L.}, year={1991}, month=nov, pages={3499–3504} }

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