DOI: 10.1149/1.2069250. Experimental Verification of a Fundamental Model for Multiwafer Low‐pressure Chemical Vapor Deposition of Polysilicon

Experimental Verification of a Fundamental Model for Multiwafer Low‐pressure Chemical Vapor Deposition of Polysilicon

10.1149/1.2069250

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Badgwell, T. A., Edgar, T. F., Trachtenberg, I., & Elliott, J. K. (1992). Experimental Verification of a Fundamental Model for Multiwafer Lowâpressure Chemical Vapor Deposition of Polysilicon. Journal of The Electrochemical Society, 139(2), 524â532.

Authors 4

Thomas A. Badgwell (first)
Thomas F. Edgar (additional)
Isaac Trachtenberg (additional)
J. Kiefer Elliott (additional)

References 0 Referenced 11

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 4:25 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 2:14 p.m.)
Indexed	1 year, 10 months ago (Oct. 24, 2023, 10:24 a.m.)
Issued	33 years, 6 months ago (Feb. 1, 1992)
Published	33 years, 6 months ago (Feb. 1, 1992)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	33 years, 6 months ago (Feb. 1, 1992)

Funders 0

None

BibTeX

@article{Badgwell_1992, title={Experimental Verification of a Fundamental Model for Multiwafer Low‐pressure Chemical Vapor Deposition of Polysilicon}, volume={139}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2069250}, DOI={10.1149/1.2069250}, number={2}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Badgwell, Thomas A. and Edgar, Thomas F. and Trachtenberg, Isaac and Elliott, J. Kiefer}, year={1992}, month=feb, pages={524–532} }

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