DOI: 10.1149/1.2069068. Compositional Analysis and Capacitance‐Voltage Properties of TiO2 Films by Low Pressure Metal‐Organic Chemical Vapor Deposition

Compositional Analysis and Capacitance‐Voltage Properties of TiO2 Films by Low Pressure Metal‐Organic Chemical Vapor Deposition

10.1149/1.2069068

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Won, T., Yoon, S., & Kim, H. (1992). Compositional Analysis and CapacitanceâVoltage Properties of TiO2 Films by Low Pressure MetalâOrganic Chemical Vapor Deposition. Journal of The Electrochemical Society, 139(11), 3284â3288.

Authors 3

Tae‐Kyung Won (first)
Soon‐Gill Yoon (additional)
Ho‐Gi Kim (additional)

References 0 Referenced 38

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 4:25 p.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 2:12 p.m.)
Indexed	3 months, 3 weeks ago (May 3, 2025, 4:24 p.m.)
Issued	32 years, 9 months ago (Nov. 1, 1992)
Published	32 years, 9 months ago (Nov. 1, 1992)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	32 years, 9 months ago (Nov. 1, 1992)

Funders 0

None

BibTeX

@article{Won_1992, title={Compositional Analysis and Capacitance‐Voltage Properties of TiO2 Films by Low Pressure Metal‐Organic Chemical Vapor Deposition}, volume={139}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2069068}, DOI={10.1149/1.2069068}, number={11}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Won, Tae‐Kyung and Yoon, Soon‐Gill and Kim, Ho‐Gi}, year={1992}, month=nov, pages={3284–3288} }

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