DOI: 10.1149/1.2056210. 50‐nm‐Thick Silicon‐on‐Insulator Fabrication by Advanced Epitaxial Lateral Overgrowth: Tunnel Epitaxy

50‐nm‐Thick Silicon‐on‐Insulator Fabrication by Advanced Epitaxial Lateral Overgrowth: Tunnel Epitaxy

10.1149/1.2056210

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Ogura, A., Furuya, A., & Koh, R. (1993). 50ânmâThick SiliconâonâInsulator Fabrication by Advanced Epitaxial Lateral Overgrowth: Tunnel Epitaxy. Journal of The Electrochemical Society, 140(4), 1125â1130.

Authors 3

Atsushi Ogura (first)
Akira Furuya (additional)
Risho Koh (additional)

References 0 Referenced 5

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 10:57 a.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 2:28 p.m.)
Indexed	1 year, 6 months ago (Feb. 3, 2024, 3:18 a.m.)
Issued	32 years, 4 months ago (April 1, 1993)
Published	32 years, 4 months ago (April 1, 1993)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	32 years, 4 months ago (April 1, 1993)

Funders 0

None

BibTeX

@article{Ogura_1993, title={50‐nm‐Thick Silicon‐on‐Insulator Fabrication by Advanced Epitaxial Lateral Overgrowth: Tunnel Epitaxy}, volume={140}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2056210}, DOI={10.1149/1.2056210}, number={4}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Ogura, Atsushi and Furuya, Akira and Koh, Risho}, year={1993}, month=apr, pages={1125–1130} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2024,
        2,
        3
      ]
    ],
    "date-time": "2024-02-03T08:18:25Z",
    "timestamp": 1706948305970
  },
  "reference-count": 0,
  "publisher": "The Electrochemical Society",
  "issue": "4",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            2019,
            12,
            7
          ]
        ],
        "date-time": "2019-12-07T00:00:00Z",
        "timestamp": 1575676800000
      },
      "content-version": "vor",
      "delay-in-days": 9746,
      "URL": "https://iopscience.iop.org/page/copyright"
    },
    {
      "start": {
        "date-parts": [
          [
            2019,
            12,
            7
          ]
        ],
        "date-time": "2019-12-07T00:00:00Z",
        "timestamp": 1575676800000
      },
      "content-version": "tdm",
      "delay-in-days": 9746,
      "URL": "https://iopscience.iop.org/info/page/text-and-data-mining"
    }
  ],
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        1993,
        4,
        1
      ]
    ]
  },
  "DOI": "10.1149/1.2056210",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2006,
        6,
        14
      ]
    ],
    "date-time": "2006-06-14T14:57:22Z",
    "timestamp": 1150297042000
  },
  "page": "1125-1130",
  "source": "Crossref",
  "is-referenced-by-count": 5,
  "title": "50\u2010nm\u2010Thick Silicon\u2010on\u2010Insulator Fabrication by Advanced Epitaxial Lateral Overgrowth: Tunnel Epitaxy",
  "prefix": "10.1149",
  "volume": "140",
  "author": [
    {
      "given": "Atsushi",
      "family": "Ogura",
      "sequence": "first",
      "affiliation": [
        {
          "name": "NEC Corporation, Microelectronics Research Laboratories, Tsukuba, Ibaraki 305, Japan"
        }
      ]
    },
    {
      "given": "Akira",
      "family": "Furuya",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "NEC Corporation, Microelectronics Research Laboratories, Tsukuba, Ibaraki 305, Japan"
        }
      ]
    },
    {
      "given": "Risho",
      "family": "Koh",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "NEC Corporation, Microelectronics Research Laboratories, Tsukuba, Ibaraki 305, Japan"
        }
      ]
    }
  ],
  "member": "77",
  "published-online": {
    "date-parts": [
      [
        2019,
        12,
        7
      ]
    ]
  },
  "container-title": "Journal of The Electrochemical Society",
  "original-title": [],
  "link": [
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2056210",
      "content-type": "text/html",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2056210/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2056210/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2056210/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2020,
        9,
        7
      ]
    ],
    "date-time": "2020-09-07T18:28:47Z",
    "timestamp": 1599503327000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2056210"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1993,
        4,
        1
      ]
    ]
  },
  "references-count": 0,
  "journal-issue": {
    "issue": "4"
  },
  "URL": "http://dx.doi.org/10.1149/1.2056210",
  "relation": {},
  "ISSN": [
    "0013-4651",
    "1945-7111"
  ],
  "subject": [],
  "container-title-short": "J. Electrochem. Soc.",
  "published": {
    "date-parts": [
      [
        1993,
        4,
        1
      ]
    ]
  }
}