DOI: 10.1149/1.2054821. Ellipsometric Examination of Structure and Growth Rate of Metallorganic Chemical Vapor Deposited Ta2 O 5 Films on Si(100)

Ellipsometric Examination of Structure and Growth Rate of Metallorganic Chemical Vapor Deposited Ta2 O 5 Films on Si(100)

10.1149/1.2054821

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

An, C. H., & Sugimoto, K. (1994). Ellipsometric Examination of Structure and Growth Rate of Metallorganic Chemical Vapor Deposited Ta2âOâ5 Films on Si(100). Journal of The Electrochemical Society, 141(3), 853â858.

Authors 2

Choon Ho An (first)
Katsuhisa Sugimoto (additional)

References 0 Referenced 27

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 10:48 a.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 2:41 p.m.)
Indexed	1 year, 1 month ago (July 5, 2024, 2:38 p.m.)
Issued	31 years, 6 months ago (March 1, 1994)
Published	31 years, 6 months ago (March 1, 1994)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	31 years, 6 months ago (March 1, 1994)

Funders 0

None

BibTeX

@article{An_1994, title={Ellipsometric Examination of Structure and Growth Rate of Metallorganic Chemical Vapor Deposited Ta2 O 5 Films on Si(100)}, volume={141}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2054821}, DOI={10.1149/1.2054821}, number={3}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={An, Choon Ho and Sugimoto, Katsuhisa}, year={1994}, month=mar, pages={853–858} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2024,
        7,
        5
      ]
    ],
    "date-time": "2024-07-05T18:38:24Z",
    "timestamp": 1720204704772
  },
  "reference-count": 0,
  "publisher": "The Electrochemical Society",
  "issue": "3",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            2019,
            12,
            7
          ]
        ],
        "date-time": "2019-12-07T00:00:00Z",
        "timestamp": 1575676800000
      },
      "content-version": "vor",
      "delay-in-days": 9412,
      "URL": "https://iopscience.iop.org/page/copyright"
    },
    {
      "start": {
        "date-parts": [
          [
            2019,
            12,
            7
          ]
        ],
        "date-time": "2019-12-07T00:00:00Z",
        "timestamp": 1575676800000
      },
      "content-version": "tdm",
      "delay-in-days": 9412,
      "URL": "https://iopscience.iop.org/info/page/text-and-data-mining"
    }
  ],
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        1994,
        3,
        1
      ]
    ]
  },
  "DOI": "10.1149/1.2054821",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2006,
        6,
        14
      ]
    ],
    "date-time": "2006-06-14T14:48:22Z",
    "timestamp": 1150296502000
  },
  "page": "853-858",
  "source": "Crossref",
  "is-referenced-by-count": 27,
  "title": "Ellipsometric Examination of Structure and Growth Rate of Metallorganic Chemical Vapor Deposited Ta2\u2009O\u20095 Films on Si(100)",
  "prefix": "10.1149",
  "volume": "141",
  "author": [
    {
      "given": "Choon Ho",
      "family": "An",
      "sequence": "first",
      "affiliation": [
        {
          "name": "Department of Metallurgy, Faculty of Engineering, Tohoku University, Sendai 980, Japan"
        }
      ]
    },
    {
      "given": "Katsuhisa",
      "family": "Sugimoto",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "Department of Metallurgy, Faculty of Engineering, Tohoku University, Sendai 980, Japan"
        }
      ]
    }
  ],
  "member": "77",
  "published-online": {
    "date-parts": [
      [
        2019,
        12,
        7
      ]
    ]
  },
  "container-title": "Journal of The Electrochemical Society",
  "original-title": [],
  "link": [
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2054821",
      "content-type": "text/html",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2054821/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2054821/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2054821/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2020,
        9,
        7
      ]
    ],
    "date-time": "2020-09-07T18:41:23Z",
    "timestamp": 1599504083000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://iopscience.iop.org/article/10.1149/1.2054821"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1994,
        3,
        1
      ]
    ]
  },
  "references-count": 0,
  "journal-issue": {
    "issue": "3"
  },
  "URL": "http://dx.doi.org/10.1149/1.2054821",
  "relation": {},
  "ISSN": [
    "0013-4651",
    "1945-7111"
  ],
  "subject": [],
  "container-title-short": "J. Electrochem. Soc.",
  "published": {
    "date-parts": [
      [
        1994,
        3,
        1
      ]
    ]
  }
}