DOI: 10.1149/1.2054733. A Study of the Dissociation State and the SiO2 Etching Reaction for HF Solutions of Extremely Low Concentration

A Study of the Dissociation State and the SiO2 Etching Reaction for HF Solutions of Extremely Low Concentration

10.1149/1.2054733

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Kikuyama, H., Waki, M., Miyashita, M., Yabune, T., Miki, N., Takano, J., & Ohmi, T. (1994). A Study of the Dissociation State and the SiO2 Etching Reaction for âHFâ Solutions of Extremely Low Concentration. Journal of The Electrochemical Society, 141(2), 366â374.

Authors 7

H. Kikuyama (first)
M. Waki (additional)
M. Miyashita (additional)
T. Yabune (additional)
N. Miki (additional)
J. Takano (additional)
T. Ohmi (additional)

References 0 Referenced 40

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 10:48 a.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 2:39 p.m.)
Indexed	5 months ago (March 29, 2025, 12:18 p.m.)
Issued	31 years, 7 months ago (Feb. 1, 1994)
Published	31 years, 7 months ago (Feb. 1, 1994)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	31 years, 7 months ago (Feb. 1, 1994)

Funders 0

None

BibTeX

@article{Kikuyama_1994, title={A Study of the Dissociation State and the SiO2 Etching Reaction for HF Solutions of Extremely Low Concentration}, volume={141}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2054733}, DOI={10.1149/1.2054733}, number={2}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Kikuyama, H. and Waki, M. and Miyashita, M. and Yabune, T. and Miki, N. and Takano, J. and Ohmi, T.}, year={1994}, month=feb, pages={366–374} }

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