DOI: 10.1149/1.2048727. Ion‐Implantation and Activation of Aluminum in 6 H ‐ SiC

Ion‐Implantation and Activation of Aluminum in 6 H ‐ SiC

10.1149/1.2048727

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Flemish, J. R., Xie, K., Du, H., & Withrow, S. P. (1995). IonâImplantation and Activation of Aluminum in 6âHââââSiC. Journal of The Electrochemical Society, 142(9), L144âL146.

Authors 4

J. R. Flemish (first)
K. Xie (additional)
H. Du (additional)
S. P. Withrow (additional)

References 0 Referenced 10

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 10:40 a.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 3:02 p.m.)
Indexed	2 years, 5 months ago (March 16, 2023, 6:52 p.m.)
Issued	30 years ago (Sept. 1, 1995)
Published	30 years ago (Sept. 1, 1995)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	30 years ago (Sept. 1, 1995)

Funders 0

None

BibTeX

@article{Flemish_1995, title={Ion‐Implantation and Activation of Aluminum in 6 H ‐ SiC}, volume={142}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2048727}, DOI={10.1149/1.2048727}, number={9}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Flemish, J. R. and Xie, K. and Du, H. and Withrow, S. P.}, year={1995}, month=sep, pages={L144–L146} }

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