DOI: 10.1149/1.2044171. Reduced Pressure Etching of Thermal Oxides in Anhydrous HF / Alcoholic Gas Mixtures

Reduced Pressure Etching of Thermal Oxides in Anhydrous HF / Alcoholic Gas Mixtures

10.1149/1.2044171

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Torek, K., Ruzyllo, J., Grant, R., & Novak, R. (1995). Reduced Pressure Etching of Thermal Oxides in Anhydrous âHFââ/âAlcoholic Gas Mixtures. Journal of The Electrochemical Society, 142(4), 1322â1326.

Authors 4

Kevin Torek (first)
Jerzy Ruzyllo (additional)
Robert Grant (additional)
Richard Novak (additional)

References 0 Referenced 37

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 10:40 a.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 2:56 p.m.)
Indexed	4 weeks, 2 days ago (July 27, 2025, 3:34 a.m.)
Issued	30 years, 4 months ago (April 1, 1995)
Published	30 years, 4 months ago (April 1, 1995)
Published Online	5 years, 8 months ago (Dec. 7, 2019)
Published Print	30 years, 4 months ago (April 1, 1995)

Funders 0

None

BibTeX

@article{Torek_1995, title={Reduced Pressure Etching of Thermal Oxides in Anhydrous HF / Alcoholic Gas Mixtures}, volume={142}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.2044171}, DOI={10.1149/1.2044171}, number={4}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Torek, Kevin and Ruzyllo, Jerzy and Grant, Robert and Novak, Richard}, year={1995}, month=apr, pages={1322–1326} }

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