DOI: 10.1149/1.1837505. Selective and Blanket Electroless Copper Deposition for Ultralarge Scale Integration

Selective and Blanket Electroless Copper Deposition for Ultralarge Scale Integration

10.1149/1.1837505

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Dubin, V. M., ShachamâDiamand, Y., Zhao, B., Vasudev, P. K., & Ting, C. H. (1997). Selective and Blanket Electroless Copper Deposition for Ultralarge Scale Integration. Journal of The Electrochemical Society, 144(3), 898â908.

Authors 5

Valery M. Dubin (first)
Yosi Shacham‐Diamand (additional)
Bin Zhao (additional)
P. K. Vasudev (additional)
Chiu H. Ting (additional)

References 0 Referenced 182

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 10:21 a.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 3:23 p.m.)
Indexed	2 months, 1 week ago (June 24, 2025, 12:29 p.m.)
Issued	28 years, 6 months ago (March 1, 1997)
Published	28 years, 6 months ago (March 1, 1997)
Published Online	5 years, 9 months ago (Dec. 6, 2019)
Published Print	28 years, 6 months ago (March 1, 1997)

Funders 0

None

BibTeX

@article{Dubin_1997, title={Selective and Blanket Electroless Copper Deposition for Ultralarge Scale Integration}, volume={144}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.1837505}, DOI={10.1149/1.1837505}, number={3}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Dubin, Valery M. and Shacham‐Diamand, Yosi and Zhao, Bin and Vasudev, P. K. and Ting, Chiu H.}, year={1997}, month=mar, pages={898–908} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        6,
        24
      ]
    ],
    "date-time": "2025-06-24T16:29:52Z",
    "timestamp": 1750782592931
  },
  "reference-count": 0,
  "publisher": "The Electrochemical Society",
  "issue": "3",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            2019,
            12,
            6
          ]
        ],
        "date-time": "2019-12-06T00:00:00Z",
        "timestamp": 1575590400000
      },
      "content-version": "vor",
      "delay-in-days": 8315,
      "URL": "https://iopscience.iop.org/page/copyright"
    },
    {
      "start": {
        "date-parts": [
          [
            2019,
            12,
            6
          ]
        ],
        "date-time": "2019-12-06T00:00:00Z",
        "timestamp": 1575590400000
      },
      "content-version": "tdm",
      "delay-in-days": 8315,
      "URL": "https://iopscience.iop.org/info/page/text-and-data-mining"
    }
  ],
  "content-domain": {
    "domain": [],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        1997,
        3,
        1
      ]
    ]
  },
  "DOI": "10.1149/1.1837505",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2006,
        6,
        14
      ]
    ],
    "date-time": "2006-06-14T14:21:48Z",
    "timestamp": 1150294908000
  },
  "page": "898-908",
  "source": "Crossref",
  "is-referenced-by-count": 182,
  "title": "Selective and Blanket Electroless Copper Deposition for Ultralarge Scale Integration",
  "prefix": "10.1149",
  "volume": "144",
  "author": [
    {
      "given": "Valery M.",
      "family": "Dubin",
      "sequence": "first",
      "affiliation": [
        {
          "name": "School of Electrical Engineering and the National Nanofabrication Facility, Cornell University, Ithaca, New York 14853"
        },
        {
          "name": "SEMATECH, Austin, Texas 78741"
        },
        {
          "name": "AMD, Sunnyvale, California 94088"
        }
      ]
    },
    {
      "given": "Yosi",
      "family": "Shacham\u2010Diamand",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "School of Electrical Engineering and the National Nanofabrication Facility, Cornell University, Ithaca, New York 14853"
        },
        {
          "name": "SEMATECH, Austin, Texas 78741"
        },
        {
          "name": "AMD, Sunnyvale, California 94088"
        }
      ]
    },
    {
      "given": "Bin",
      "family": "Zhao",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "School of Electrical Engineering and the National Nanofabrication Facility, Cornell University, Ithaca, New York 14853"
        },
        {
          "name": "SEMATECH, Austin, Texas 78741"
        },
        {
          "name": "AMD, Sunnyvale, California 94088"
        }
      ]
    },
    {
      "given": "P. K.",
      "family": "Vasudev",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "School of Electrical Engineering and the National Nanofabrication Facility, Cornell University, Ithaca, New York 14853"
        },
        {
          "name": "SEMATECH, Austin, Texas 78741"
        },
        {
          "name": "AMD, Sunnyvale, California 94088"
        }
      ]
    },
    {
      "given": "Chiu H.",
      "family": "Ting",
      "sequence": "additional",
      "affiliation": [
        {
          "name": "School of Electrical Engineering and the National Nanofabrication Facility, Cornell University, Ithaca, New York 14853"
        },
        {
          "name": "SEMATECH, Austin, Texas 78741"
        },
        {
          "name": "AMD, Sunnyvale, California 94088"
        }
      ]
    }
  ],
  "member": "77",
  "published-online": {
    "date-parts": [
      [
        2019,
        12,
        6
      ]
    ]
  },
  "container-title": "Journal of The Electrochemical Society",
  "original-title": [],
  "link": [
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.1837505",
      "content-type": "text/html",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.1837505/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.1837505/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1149/1.1837505/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2020,
        9,
        7
      ]
    ],
    "date-time": "2020-09-07T19:23:55Z",
    "timestamp": 1599506635000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://iopscience.iop.org/article/10.1149/1.1837505"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1997,
        3,
        1
      ]
    ]
  },
  "references-count": 0,
  "journal-issue": {
    "issue": "3"
  },
  "URL": "http://dx.doi.org/10.1149/1.1837505",
  "relation": {},
  "ISSN": [
    "0013-4651",
    "1945-7111"
  ],
  "subject": [],
  "container-title-short": "J. Electrochem. Soc.",
  "published": {
    "date-parts": [
      [
        1997,
        3,
        1
      ]
    ]
  }
}