DOI: 10.1149/1.1836568. Leakage Current Mechanism of Amorphous and Polycrystalline Ta2 O 5 Films Grown by Chemical Vapor Deposition

Leakage Current Mechanism of Amorphous and Polycrystalline Ta2 O 5 Films Grown by Chemical Vapor Deposition

10.1149/1.1836568

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Aoyama, T., Saida, S., Okayama, Y., Fujisaki, M., Imai, K., & Arikado, T. (1996). Leakage Current Mechanism of Amorphous and Polycrystalline Ta2âOâ5 Films Grown by Chemical Vapor Deposition. Journal of The Electrochemical Society, 143(3), 977â983.

Authors 6

Tomonori Aoyama (first)
Shigehiko Saida (additional)
Yasunori Okayama (additional)
Masanori Fujisaki (additional)
Keitaro Imai (additional)
Tsunetoshi Arikado (additional)

References 0 Referenced 73

None

Dates

Type	When
Created	19 years, 2 months ago (June 14, 2006, 10:22 a.m.)
Deposited	4 years, 11 months ago (Sept. 7, 2020, 3:10 p.m.)
Indexed	2 months, 1 week ago (June 24, 2025, 7:29 a.m.)
Issued	29 years, 5 months ago (March 1, 1996)
Published	29 years, 5 months ago (March 1, 1996)
Published Online	5 years, 8 months ago (Dec. 6, 2019)
Published Print	29 years, 5 months ago (March 1, 1996)

Funders 0

None

BibTeX

@article{Aoyama_1996, title={Leakage Current Mechanism of Amorphous and Polycrystalline Ta2 O 5 Films Grown by Chemical Vapor Deposition}, volume={143}, ISSN={1945-7111}, url={http://dx.doi.org/10.1149/1.1836568}, DOI={10.1149/1.1836568}, number={3}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Aoyama, Tomonori and Saida, Shigehiko and Okayama, Yasunori and Fujisaki, Masanori and Imai, Keitaro and Arikado, Tsunetoshi}, year={1996}, month=mar, pages={977–983} }

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