DOI: 10.1149/1.1468646. Morphology and Magnetic Properties of Co Thin Films Electrodeposited on Si

Morphology and Magnetic Properties of Co Thin Films Electrodeposited on Si

10.1149/1.1468646

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Munford, M. L., Sartorelli, M. L., Seligman, L., & Pasa, A. A. (2002). Morphology and Magnetic Properties of Co Thin Films Electrodeposited on Si. Journal of The Electrochemical Society, 149(5), C274.

Authors 4

M. L. Munford (first)
M. L. Sartorelli (additional)
L. Seligman (additional)
A. A. Pasa (additional)

References 28 Referenced 57

10.1149/1.2048429 / J. Electrochem. Soc. by Wisniewski (1995)
10.1016/S0167-9317(96)00040-8 / Microelectron. Eng. by dos Santos Filho (1997)
10.1063/1.365305 / J. Appl. Phys. by Gao (1998)
10.1063/1.122066 / Appl. Phys. Lett. by O’Keeffe (1998)
10.1088/0022-3727/31/16/001 / J. Phys. D by Oskam (1998)
10.1002/(SICI)1521-396X(199905)173:1<73::AID-PSSA73>3.0.CO;2-8 / Phys. Status Solidi by Pasa (1999)
10.1149/1.1393507 / J. Electrochem. Soc. by Oskam (2000)
10.1016/S0013-4686(00)00418-7 / Electrochim. Acta by Krumm (2000)
10.1016/S0169-4332(00)00398-6 / Appl. Surf. Sci. by Cerisier (2000)
10.1016/S0304-8853(01)00082-8 / J. Magn. Magn. Mater. by Munford (2001)
10.1002/1521-396X(200109)187:1<91::AID-PSSA91>3.0.CO;2-9 / Phys. Status Solidi by Sartorelli (2001)
10.1149/1.1387238 / J. Electrochem. Soc. by Zambelli (2001)
10.1002/1521-396X(200109)187:1<85::AID-PSSA85>3.0.CO;2-O / Phys. Status Solidi by da Silva (2001)
10.1016/0022-0728(82)85080-8 / J. Electroanal. Chem. by Gunawardena (1982)
10.1016/0013-4686(83)85163-9 / Electrochim. Acta by Scharifker (1983)
10.1109/20.619487 / IEEE Trans. Magn. by Cheng (1997)
10.1016/S0039-6028(97)00837-6 / Surf. Sci. by Min (1998)
10.1016/S0304-8853(00)00341-3 / J. Magn. Magn. Mater. by Li (2000)
10.1088/0953-8984/12/35/306 / J. Phys.: Condens. Matter by Camarero (2000)
10.1109/20.908637 / IEEE Trans. Magn. by Barnes (2000)
10.1116/1.588804 / J. Vac. Sci. Technol. B by Jiang (1996)
10.1016/S0039-6028(96)01162-4 / Surf. Sci. by Jiang (1997)
10.1109/20.706279 / IEEE Trans. Magn. by Doherty (1998)
10.1063/1.367357 / J. Appl. Phys. by Li (1998)
10.1063/1.370123 / J. Appl. Phys. by Choe (1999)
10.1063/1.371030 / J. Appl. Phys. by Palasantzas (1999)
10.1063/1.1331065 / J. Appl. Phys. by Zhao (2001)
10.1063/1.350045 / J. Appl. Phys. by Wan (1991)

Dates

Type	When
Created	23 years, 1 month ago (July 26, 2002, 10:25 a.m.)
Deposited	5 years, 7 months ago (Jan. 10, 2020, 4:51 p.m.)
Indexed	1 week, 2 days ago (Aug. 22, 2025, 12:45 a.m.)
Issued	23 years, 7 months ago (Jan. 1, 2002)
Published	23 years, 7 months ago (Jan. 1, 2002)
Published Print	23 years, 7 months ago (Jan. 1, 2002)

Funders 0

None

BibTeX

@article{Munford_2002, title={Morphology and Magnetic Properties of Co Thin Films Electrodeposited on Si}, volume={149}, ISSN={0013-4651}, url={http://dx.doi.org/10.1149/1.1468646}, DOI={10.1149/1.1468646}, number={5}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Munford, M. L. and Sartorelli, M. L. and Seligman, L. and Pasa, A. A.}, year={2002}, pages={C274} }

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