DOI: 10.1149/1.1393454. Depth Profile Analysis of Ultrathin Silicon Oxynitride Films by ToF-SIMS

Depth Profile Analysis of Ultrathin Silicon Oxynitride Films by ToF-SIMS

10.1149/1.1393454

Crossref journal-article

The Electrochemical Society

Journal of The Electrochemical Society (77)

Bibliography

Douglas, M. A., Hattangady, S., & Eason, K. (2000). Depth Profile Analysis of Ultrathin Silicon Oxynitride Films by ToF-SIMS. Journal of The Electrochemical Society, 147(5), 1893.

Authors 3

Monte A. Douglas (first)
Sunil Hattangady (additional)
Kwame Eason (additional)

References 0 Referenced 13

None

Dates

Type	When
Created	23 years ago (July 28, 2002, 6:22 p.m.)
Deposited	5 years, 7 months ago (Jan. 13, 2020, 8:15 a.m.)
Indexed	1 year, 5 months ago (March 16, 2024, 3:48 a.m.)
Issued	25 years, 7 months ago (Jan. 1, 2000)
Published	25 years, 7 months ago (Jan. 1, 2000)
Published Print	25 years, 7 months ago (Jan. 1, 2000)

Funders 0

None

BibTeX

@article{Douglas_2000, title={Depth Profile Analysis of Ultrathin Silicon Oxynitride Films by ToF-SIMS}, volume={147}, ISSN={0013-4651}, url={http://dx.doi.org/10.1149/1.1393454}, DOI={10.1149/1.1393454}, number={5}, journal={Journal of The Electrochemical Society}, publisher={The Electrochemical Society}, author={Douglas, Monte A. and Hattangady, Sunil and Eason, Kwame}, year={2000}, pages={1893} }

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