Abstract
An electron beam technique of measuring resistivity is reported. An electron beam was continuously scanned upon the specimen bar, and the ohmic drop (resistance × electron beam current) was electronically differentiated to get the resistivity. Resultant signal was displayed on a synchroscope screen. The technique was testified by using a GaAs bar whose dimensions were 0.5×0.9×7.0 mm3. The resistivity distribution was measured along the long axis. Energy, current and diameter of the beam were 15 keV, 5.5 nA and about 20 µm, respectively. Maximum resistivity of 4 M\varOmegacm was measured in a measuring time of 10 seconds.
References
5
Referenced
1
10.1143/JJAP.4.250
/ Jpn. J. Appl. Phys. (1965)10.1143/JJAP.5.1157
/ Jpn. J. Appl. Phys. (1966){'key': ''}
{'key': '', 'first-page': '639', 'volume': '1', 'year': '1968', 'journal-title': 'J. Sci. Instrum. Series 2'}
/ J. Sci. Instrum. Series 2 (1968)10.1143/JJAP.6.963
/ Jpn. J. Appl. Phys. (1967)
Dates
Type | When |
---|---|
Created | 19 years, 9 months ago (Nov. 4, 2005, 2:16 a.m.) |
Deposited | 2 years, 8 months ago (Nov. 28, 2022, 5:51 a.m.) |
Indexed | 6 months ago (Feb. 21, 2025, 5:36 a.m.) |
Issued | 55 years, 9 months ago (Nov. 1, 1969) |
Published | 55 years, 9 months ago (Nov. 1, 1969) |
Published Print | 55 years, 9 months ago (Nov. 1, 1969) |
@article{Munakata_1969, title={Measurement of Resistance by Means of Electron Beam -III-}, volume={8}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.8.1307}, DOI={10.1143/jjap.8.1307}, number={11}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Munakata, Chusuke and Watanabe, Hiroshi}, year={1969}, month=nov, pages={1307} }