DOI: 10.1143/jjap.6.274. An Electron Beam Method of Measuring Deffusion Voltage in Semiconductors

An Electron Beam Method of Measuring Deffusion Voltage in Semiconductors

10.1143/jjap.6.274

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Bibliography

Munakata, C. (1967). An Electron Beam Method of Measuring Deffusion Voltage in Semiconductors. Japanese Journal of Applied Physics, 6(2), 274.

Authors 1

Chusuke Munakata (first)

References 3 Referenced 6

{'year': '1959', 'key': ''} (1959)
{'year': '1966', 'key': ''} (1966)
{'year': '1965', 'key': ''} (1965)

Dates

Type	When
Created	19 years, 9 months ago (Nov. 4, 2005, 2:20 a.m.)
Deposited	2 years, 8 months ago (Nov. 28, 2022, 6:13 a.m.)
Indexed	6 months ago (Feb. 21, 2025, 5:36 a.m.)
Issued	58 years, 6 months ago (Feb. 1, 1967)
Published	58 years, 6 months ago (Feb. 1, 1967)
Published Print	58 years, 6 months ago (Feb. 1, 1967)

Funders 0

None

BibTeX

@article{Munakata_1967, title={An Electron Beam Method of Measuring Deffusion Voltage in Semiconductors}, volume={6}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.6.274}, DOI={10.1143/jjap.6.274}, number={2}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Munakata, Chusuke}, year={1967}, month=feb, pages={274} }

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