DOI: 10.1143/jjap.5.1157. Measurement of Resistance by Means of Electron Beam –II

Measurement of Resistance by Means of Electron Beam –II–

10.1143/jjap.5.1157

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

Resistance of semiconductor materials was measured by using a focused electron beam. The experimental error was mainly due to the bulk electron voltaic effect in the material. To reduce the error, the surface of the specimen was sand-lapped. After the treatment the electron beam technique was successfully applied to semiconductor materials, within the error of a few per cent. Energy and current of the electron beam were in the range of 5 to 30 KeV and approximately 1 µA, respectively.

Bibliography

Munakata, C., & Watanabe, H. (1966). Measurement of Resistance by Means of Electron Beam âIIâ. Japanese Journal of Applied Physics, 5(12), 1157.

Authors 2

Chusuke Munakata (first)
Hiroshi Watanabe (additional)

References 9 Referenced 1

10.1143/JJAP.4.250 / Jpn. J. Appl. Phys. (1965)
10.1143/JJAP.4.697 / Jpn. J. Appl. Phys. (1965)
10.1143/JJAP.5.756 / Jpn. J. Appl. Phys. (1966)
10.1143/JJAP.5.249 / Jpn. J. Appl. Phys. (1966)
10.1143/JJAP.4.815 / Jpn. J. Appl. Phys. (1965)
{'year': '1950', 'key': ''} (1950)
{'year': '1965', 'key': ''} (1965)
{'key': '', 'first-page': '9', 'volume': '67', 'year': '1954', 'journal-title': 'Proc. Phys. Soc.'} / Proc. Phys. Soc. (1954)
{'key': '', 'first-page': '371', 'volume': '21', 'year': '1962', 'journal-title': 'Acta Phys. Polon.'} / Acta Phys. Polon. (1962)

Dates

Type	When
Created	19 years, 9 months ago (Nov. 4, 2005, 2:26 a.m.)
Deposited	2 years, 9 months ago (Nov. 25, 2022, 7:48 a.m.)
Indexed	6 months, 1 week ago (Feb. 21, 2025, 5:36 a.m.)
Issued	58 years, 8 months ago (Dec. 1, 1966)
Published	58 years, 8 months ago (Dec. 1, 1966)
Published Print	58 years, 8 months ago (Dec. 1, 1966)

Funders 0

None

BibTeX

@article{Munakata_1966, title={Measurement of Resistance by Means of Electron Beam –II–}, volume={5}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.5.1157}, DOI={10.1143/jjap.5.1157}, number={12}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Munakata, Chusuke and Watanabe, Hiroshi}, year={1966}, month=dec, pages={1157} }

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