DOI: 10.1143/jjap.36.4897. Carbon Nitride Films Produced Using Electron Cyclotron Resonance Nitrogen Plasmas

Carbon Nitride Films Produced Using Electron Cyclotron Resonance Nitrogen Plasmas

10.1143/jjap.36.4897

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

Carbon nitride films have been produced using electron cyclotron resonance (ECR) nitrogen plasmas. The results of optical emission spectroscopy indicate that reactive nitrogen species are more easily generated than methane-derived species downstream in an ECR plasma. The effect of varying the gas ratio of N2 to CH4 as well as the substrate temperature on the N/C composition ratio in the film and on the film structure have been investigated. The film growth rate decreases but the concentration of nitrogen in the film increases as the gas ratio of N2 to CH4 increases. At lower substrate temperatures, both the deposition rate and the nitrogen concentration increase. The ratio of carbon to nitrogen in the film increases from 12% to 40% as the substrate temperature is lowered from 26°C to 5°C.

Bibliography

Mei Zhang, M. Z., Lujun Pan, L. P., Tsutomu Miyazaki, T. M., & Yoshikazu Nakayama, Y. N. (1997). Carbon Nitride Films Produced Using Electron Cyclotron Resonance Nitrogen Plasmas. Japanese Journal of Applied Physics, 36(7S), 4897.

Authors 4

Mei Zhang Mei Zhang (first)
Lujun Pan Lujun Pan (additional)
Tsutomu Miyazaki Tsutomu Miyazaki (additional)
Yoshikazu Nakayama Yoshikazu Nakayama (additional)

References 15 Referenced 9

10.1126/science.245.4920.841 / Science (1989)
10.1557/JMR.1990.2490 / J. Mater. Res. (1993)
10.1063/1.360397 / J. Appl. Phys. (1995)
10.1002/pssb.2221920218 / Phys. Status Solidi b (1995)
10.1116/1.578765 / J. Vac. Sci. Technol. A (1993)
{'key': '', 'first-page': '335', 'volume': '261', 'year': '1993', 'journal-title': 'Science'} / Science (1993)
10.1143/JJAP.32.L420 / Jpn. J. Appl. Phys. (1993)
10.1116/1.579528 / J. Vac. Sci. Technol. A (1995)
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10.1063/1.115972 / Appl. Phys. Lett. (1996)
10.1016/0925-9635(94)90036-1 / Diamond Related Mater. (1993)
10.1016/0925-9635(94)90114-7 / Diamond Related Mater. (1994)
10.1063/1.361439 / J. Appl. Phys. (1996)
10.1007/978-94-009-5758-9 (1976)
10.1063/1.349043 / J. Appl. Phys. (1991)

Dates

Type	When
Created	22 years, 10 months ago (Oct. 1, 2002, 6:25 p.m.)
Deposited	2 years, 8 months ago (Dec. 14, 2022, 12:56 p.m.)
Indexed	6 months, 1 week ago (Feb. 21, 2025, 5:33 a.m.)
Issued	28 years, 2 months ago (July 1, 1997)
Published	28 years, 2 months ago (July 1, 1997)
Published Print	28 years, 2 months ago (July 1, 1997)

Funders 0

None

BibTeX

@article{Mei_Zhang_1997, title={Carbon Nitride Films Produced Using Electron Cyclotron Resonance Nitrogen Plasmas}, volume={36}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.36.4897}, DOI={10.1143/jjap.36.4897}, number={7S}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Mei Zhang, Mei Zhang and Lujun Pan, Lujun Pan and Tsutomu Miyazaki, Tsutomu Miyazaki and Yoshikazu Nakayama, Yoshikazu Nakayama}, year={1997}, month=jul, pages={4897} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        2,
        21
      ]
    ],
    "date-time": "2025-02-21T10:33:30Z",
    "timestamp": 1740134010230,
    "version": "3.37.3"
  },
  "reference-count": 15,
  "publisher": "IOP Publishing",
  "issue": "7S",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            1997,
            7,
            1
          ]
        ],
        "date-time": "1997-07-01T00:00:00Z",
        "timestamp": 867715200000
      },
      "content-version": "vor",
      "delay-in-days": 0,
      "URL": "https://iopscience.iop.org/page/copyright"
    },
    {
      "start": {
        "date-parts": [
          [
            1997,
            7,
            1
          ]
        ],
        "date-time": "1997-07-01T00:00:00Z",
        "timestamp": 867715200000
      },
      "content-version": "tdm",
      "delay-in-days": 0,
      "URL": "https://iopscience.iop.org/info/page/text-and-data-mining"
    }
  ],
  "content-domain": {
    "domain": [
      "iopscience.iop.org"
    ],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        1997,
        7,
        1
      ]
    ]
  },
  "abstract": "<jats:p> \n    Carbon nitride films have been produced using electron cyclotron resonance (ECR) nitrogen plasmas. The results of optical emission spectroscopy indicate that reactive nitrogen species are more easily generated than methane-derived species downstream in an ECR plasma. The effect of varying the gas ratio of N<jats:sub>2</jats:sub> to CH<jats:sub>4</jats:sub> as well as the substrate temperature on the N/C composition ratio in the film and on the film structure have been  investigated. The film growth rate decreases but the concentration of nitrogen in the film increases as the gas ratio of N<jats:sub>2</jats:sub> to CH<jats:sub>4</jats:sub> increases. At lower substrate temperatures, both the deposition rate and the nitrogen concentration increase. The ratio of carbon to nitrogen in the film increases from 12% to 40% as the substrate temperature is lowered from 26\u00b0C to 5\u00b0C.    \n   </jats:p>",
  "DOI": "10.1143/jjap.36.4897",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2002,
        10,
        1
      ]
    ],
    "date-time": "2002-10-01T22:25:44Z",
    "timestamp": 1033511144000
  },
  "page": "4897",
  "update-policy": "https://doi.org/10.1088/crossmark-policy",
  "source": "Crossref",
  "is-referenced-by-count": 9,
  "title": "Carbon Nitride Films Produced Using Electron Cyclotron Resonance Nitrogen Plasmas",
  "prefix": "10.35848",
  "volume": "36",
  "author": [
    {
      "given": "Mei Zhang",
      "family": "Mei Zhang",
      "sequence": "first",
      "affiliation": []
    },
    {
      "given": "Lujun Pan",
      "family": "Lujun Pan",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Tsutomu Miyazaki",
      "family": "Tsutomu Miyazaki",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Yoshikazu Nakayama",
      "family": "Yoshikazu Nakayama",
      "sequence": "additional",
      "affiliation": []
    }
  ],
  "member": "266",
  "reference": [
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "841",
      "DOI": "10.1126/science.245.4920.841",
      "volume": "245",
      "year": "1989",
      "journal-title": "Science"
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "2490",
      "DOI": "10.1557/JMR.1990.2490",
      "volume": "5",
      "year": "1993",
      "journal-title": "J. Mater. Res."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "7416",
      "DOI": "10.1063/1.360397",
      "volume": "78",
      "year": "1995",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "493",
      "DOI": "10.1002/pssb.2221920218",
      "volume": "192",
      "year": "1995",
      "journal-title": "Phys. Status Solidi b"
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "521",
      "DOI": "10.1116/1.578765",
      "volume": "11",
      "year": "1993",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "",
      "first-page": "335",
      "volume": "261",
      "year": "1993",
      "journal-title": "Science"
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "L420",
      "DOI": "10.1143/JJAP.32.L420",
      "volume": "32",
      "year": "1993",
      "journal-title": "Jpn. J. Appl. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "2110",
      "DOI": "10.1116/1.579528",
      "volume": "13",
      "year": "1995",
      "journal-title": "J. Vac. Sci. Technol. A"
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "2364",
      "DOI": "10.1063/1.361163",
      "volume": "79",
      "year": "1996",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "1211",
      "DOI": "10.1063/1.115972",
      "volume": "68",
      "year": "1996",
      "journal-title": "Appl. Phys. Lett."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "88",
      "DOI": "10.1016/0925-9635(94)90036-1",
      "volume": "3",
      "year": "1993",
      "journal-title": "Diamond Related Mater."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "1034",
      "DOI": "10.1016/0925-9635(94)90114-7",
      "volume": "3",
      "year": "1994",
      "journal-title": "Diamond Related Mater."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "7227",
      "DOI": "10.1063/1.361439",
      "volume": "79",
      "year": "1996",
      "journal-title": "J. Appl. Phys."
    },
    {
      "year": "1976",
      "key": "",
      "doi-asserted-by": "publisher",
      "DOI": "10.1007/978-94-009-5758-9"
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "4958",
      "DOI": "10.1063/1.349043",
      "volume": "70",
      "year": "1991",
      "journal-title": "J. Appl. Phys."
    }
  ],
  "container-title": "Japanese Journal of Applied Physics",
  "original-title": [],
  "link": [
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.36.4897",
      "content-type": "text/html",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.36.4897/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.36.4897/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.36.4897/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2022,
        12,
        14
      ]
    ],
    "date-time": "2022-12-14T17:56:51Z",
    "timestamp": 1671040611000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.36.4897"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1997,
        7,
        1
      ]
    ]
  },
  "references-count": 15,
  "journal-issue": {
    "issue": "7S",
    "published-print": {
      "date-parts": [
        [
          1997,
          7,
          1
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1143/JJAP.36.4897",
  "relation": {},
  "ISSN": [
    "0021-4922",
    "1347-4065"
  ],
  "subject": [],
  "container-title-short": "Jpn. J. Appl. Phys.",
  "published": {
    "date-parts": [
      [
        1997,
        7,
        1
      ]
    ]
  },
  "assertion": [
    {
      "value": "Carbon Nitride Films Produced Using Electron Cyclotron Resonance Nitrogen Plasmas",
      "name": "article_title",
      "label": "Article Title"
    },
    {
      "value": "Japanese Journal of Applied Physics",
      "name": "journal_title",
      "label": "Journal Title"
    },
    {
      "value": "paper",
      "name": "article_type",
      "label": "Article Type"
    },
    {
      "value": "Copyright (c) 1997 The Japan Society of Applied Physics",
      "name": "copyright_information",
      "label": "Copyright Information"
    },
    {
      "value": "1997-01-21",
      "name": "date_received",
      "label": "Date Received",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    },
    {
      "value": "1997-03-06",
      "name": "date_accepted",
      "label": "Date Accepted",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    },
    {
      "name": "date_epub",
      "label": "Online publication date",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    }
  ]
}