DOI: 10.1143/jjap.35.l328. Preferred Orientations of NiO Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

Preferred Orientations of NiO Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

10.1143/jjap.35.l328

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

Thin films of nickel oxide (NiO) with NaCl-type structure were prepared on glass substrates at 400°C by plasma-enhanced metalorganic chemical vapor deposition using nickel acetylacetonate as a source material. The relationship between O2 flow rate, and preferred orientation and microstructure of the NiO films was investigated. Highly crystalline NiO film with (111) orientation was obtained at O2 flow rates as low as 3 cm3/min. As the O2 flow rate increased from 3 to 70 cm3/min, the orientation of NiO films changed from (111) to (100) and deposition rate decreased from 17 to 11 nm/min. Films with both (111) and (100) orientation had columnar structure. The origin of the preferred orientation of the NiO films was discussed.

Bibliography

Fujii, E., Tomozawa, A., Hideo Torii, H. T., & Ryoichi Takayama, R. T. (1996). Preferred Orientations of NiO Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition. Japanese Journal of Applied Physics, 35(3A), L328.

Authors 4

Eiji Fujii (first)
Atsushi Tomozawa (additional)
Hideo Torii Hideo Torii (additional)
Ryoichi Takayama Ryoichi Takayama (additional)

References 9 Referenced 132

10.1063/1.352426 / J. Appl. Phys. (1993)
10.1016/0040-6090(93)90636-4 / Thin Solid Films (1993)
10.1063/1.341066 / J. Appl. Phys. (1988)
{'key': '', 'first-page': '56', 'volume': '1149', 'year': '1989', 'journal-title': 'Proc. Soc. Photo-Opt. Instrum. Eng.'} / Proc. Soc. Photo-Opt. Instrum. Eng. (1989)
10.1143/JJAP.33.6656 / Jpn. J. Appl. Phys. (1994)
10.2109/jcersj.101.227 / J. Ceram. Soc. Jpn. (1993)
10.1143/JJAP.32.L1448 / Jpn. J. Appl. Phys. (1993)
10.1063/1.112016 / Appl. Phys. Lett. (1994)
10.2497/jjspm.40.618 / J. Jpn. Soc. Powder & Powder Metallurgy (1993)

Dates

Type	When
Created	22 years, 10 months ago (Oct. 1, 2002, 5:20 p.m.)
Deposited	2 years, 8 months ago (Dec. 14, 2022, 12:30 p.m.)
Indexed	3 days, 8 hours ago (Aug. 20, 2025, 8:20 a.m.)
Issued	29 years, 5 months ago (March 1, 1996)
Published	29 years, 5 months ago (March 1, 1996)
Published Print	29 years, 5 months ago (March 1, 1996)

Funders 0

None

BibTeX

@article{Fujii_1996, title={Preferred Orientations of NiO Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition}, volume={35}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.35.l328}, DOI={10.1143/jjap.35.l328}, number={3A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Fujii, Eiji and Tomozawa, Atsushi and Hideo Torii, Hideo Torii and Ryoichi Takayama, Ryoichi Takayama}, year={1996}, month=mar, pages={L328} }

JSON

{
  "indexed": {
    "date-parts": [
      [
        2025,
        8,
        20
      ]
    ],
    "date-time": "2025-08-20T12:20:29Z",
    "timestamp": 1755692429081,
    "version": "3.37.3"
  },
  "reference-count": 9,
  "publisher": "IOP Publishing",
  "issue": "3A",
  "license": [
    {
      "start": {
        "date-parts": [
          [
            1996,
            3,
            1
          ]
        ],
        "date-time": "1996-03-01T00:00:00Z",
        "timestamp": 825638400000
      },
      "content-version": "vor",
      "delay-in-days": 0,
      "URL": "https://iopscience.iop.org/page/copyright"
    },
    {
      "start": {
        "date-parts": [
          [
            1996,
            3,
            1
          ]
        ],
        "date-time": "1996-03-01T00:00:00Z",
        "timestamp": 825638400000
      },
      "content-version": "tdm",
      "delay-in-days": 0,
      "URL": "https://iopscience.iop.org/info/page/text-and-data-mining"
    }
  ],
  "content-domain": {
    "domain": [
      "iopscience.iop.org"
    ],
    "crossmark-restriction": false
  },
  "published-print": {
    "date-parts": [
      [
        1996,
        3,
        1
      ]
    ]
  },
  "abstract": "<jats:p> \n   Thin films of nickel oxide (NiO) with NaCl-type structure were prepared on glass substrates at  400\u00b0C by plasma-enhanced metalorganic   chemical vapor deposition using nickel acetylacetonate as a source   material. The relationship between  O<jats:sub>2</jats:sub> flow rate, and preferred orientation and microstructure of the NiO films was investigated. Highly   crystalline NiO film with (111) orientation was obtained at  O<jats:sub>2</jats:sub> flow   rates as low as  3 cm<jats:sup>3</jats:sup>/min. As the  O<jats:sub>2</jats:sub> flow rate increased from 3 to  70 cm<jats:sup>3</jats:sup>/min, the orientation of NiO films changed from (111) to (100) and   deposition rate decreased from 17 to 11 nm/min. Films with both (111)   and (100) orientation had columnar structure. The origin of the preferred orientation of the NiO films was discussed. \n   </jats:p>",
  "DOI": "10.1143/jjap.35.l328",
  "type": "journal-article",
  "created": {
    "date-parts": [
      [
        2002,
        10,
        1
      ]
    ],
    "date-time": "2002-10-01T21:20:07Z",
    "timestamp": 1033507207000
  },
  "page": "L328",
  "update-policy": "https://doi.org/10.1088/crossmark-policy",
  "source": "Crossref",
  "is-referenced-by-count": 132,
  "title": "Preferred Orientations of NiO Films Prepared by Plasma-Enhanced    Metalorganic Chemical Vapor Deposition",
  "prefix": "10.35848",
  "volume": "35",
  "author": [
    {
      "given": "Eiji",
      "family": "Fujii",
      "sequence": "first",
      "affiliation": []
    },
    {
      "given": "Atsushi",
      "family": "Tomozawa",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Hideo Torii",
      "family": "Hideo Torii",
      "sequence": "additional",
      "affiliation": []
    },
    {
      "given": "Ryoichi Takayama",
      "family": "Ryoichi Takayama",
      "sequence": "additional",
      "affiliation": []
    }
  ],
  "member": "266",
  "reference": [
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "6892",
      "DOI": "10.1063/1.352426",
      "volume": "73",
      "year": "1993",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "27",
      "DOI": "10.1016/0040-6090(93)90636-4",
      "volume": "236",
      "year": "1993",
      "journal-title": "Thin Solid Films"
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "2116",
      "DOI": "10.1063/1.341066",
      "volume": "63",
      "year": "1988",
      "journal-title": "J. Appl. Phys."
    },
    {
      "key": "",
      "first-page": "56",
      "volume": "1149",
      "year": "1989",
      "journal-title": "Proc. Soc. Photo-Opt. Instrum. Eng."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "6656",
      "DOI": "10.1143/JJAP.33.6656",
      "volume": "33",
      "year": "1994",
      "journal-title": "Jpn. J. Appl. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "227",
      "DOI": "10.2109/jcersj.101.227",
      "volume": "101",
      "year": "1993",
      "journal-title": "J. Ceram. Soc. Jpn."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "L1448",
      "DOI": "10.1143/JJAP.32.L1448",
      "volume": "32",
      "year": "1993",
      "journal-title": "Jpn. J. Appl. Phys."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "1463",
      "DOI": "10.1063/1.112016",
      "volume": "65",
      "year": "1994",
      "journal-title": "Appl. Phys. Lett."
    },
    {
      "key": "",
      "doi-asserted-by": "publisher",
      "first-page": "618",
      "DOI": "10.2497/jjspm.40.618",
      "volume": "40",
      "year": "1993",
      "journal-title": "J. Jpn. Soc. Powder & Powder Metallurgy"
    }
  ],
  "container-title": "Japanese Journal of Applied Physics",
  "original-title": [],
  "link": [
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.35.L328",
      "content-type": "text/html",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.35.L328/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "text-mining"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.35.L328/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "syndication"
    },
    {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.35.L328/pdf",
      "content-type": "application/pdf",
      "content-version": "vor",
      "intended-application": "similarity-checking"
    }
  ],
  "deposited": {
    "date-parts": [
      [
        2022,
        12,
        14
      ]
    ],
    "date-time": "2022-12-14T17:30:58Z",
    "timestamp": 1671039058000
  },
  "score": 1,
  "resource": {
    "primary": {
      "URL": "https://iopscience.iop.org/article/10.1143/JJAP.35.L328"
    }
  },
  "subtitle": [],
  "short-title": [],
  "issued": {
    "date-parts": [
      [
        1996,
        3,
        1
      ]
    ]
  },
  "references-count": 9,
  "journal-issue": {
    "issue": "3A",
    "published-print": {
      "date-parts": [
        [
          1996,
          3,
          1
        ]
      ]
    }
  },
  "URL": "http://dx.doi.org/10.1143/JJAP.35.L328",
  "relation": {},
  "ISSN": [
    "0021-4922",
    "1347-4065"
  ],
  "subject": [],
  "container-title-short": "Jpn. J. Appl. Phys.",
  "published": {
    "date-parts": [
      [
        1996,
        3,
        1
      ]
    ]
  },
  "assertion": [
    {
      "value": "Preferred Orientations of NiO Films Prepared by Plasma-Enhanced    Metalorganic Chemical Vapor Deposition",
      "name": "article_title",
      "label": "Article Title"
    },
    {
      "value": "Japanese Journal of Applied Physics",
      "name": "journal_title",
      "label": "Journal Title"
    },
    {
      "value": "paper",
      "name": "article_type",
      "label": "Article Type"
    },
    {
      "value": "Copyright (c) 1996 The Japan Society of Applied Physics",
      "name": "copyright_information",
      "label": "Copyright Information"
    },
    {
      "value": "1995-12-04",
      "name": "date_received",
      "label": "Date Received",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    },
    {
      "value": "1996-01-17",
      "name": "date_accepted",
      "label": "Date Accepted",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    },
    {
      "name": "date_epub",
      "label": "Online publication date",
      "group": {
        "name": "publication_dates",
        "label": "Publication dates"
      }
    }
  ]
}