DOI: 10.1143/jjap.32.l1465. Structural Properties of Amorphous Carbon Nitride Films Prepared by Reactive RF-Magnetron Sputtering

Structural Properties of Amorphous Carbon Nitride Films Prepared by Reactive RF-Magnetron Sputtering

10.1143/jjap.32.l1465

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

Highly nitrogenated amorphous carbon films have been prepared by reactive rf-magnetron sputtering using pure N2 or Ar/N2 mixed gases. The nitrogen content measured by Rutherford backscattering spectrometry was 40 at% for pure N2 gas and 35 at% for Ar75%-N225% mixed gas. Oxygen atoms of about 7 at% were also detected. Infrared spectra showed a broad absorption band in the range from 1200 to 1600 cm-1 assigned to the N atoms incorporated in the bonding network of amorphous carbon. They showed an absorption band near 2200 cm-1 assigned to the C≡N or N=C=O bond, but no trace of the N-H or C-H bond was seen.

Bibliography

Nakayama, N., Tsuchiya, Y., Tamada, S., Kosuge, K., Nagata, S., Takahiro, K., & Yamaguchi, S. (1993). Structural Properties of Amorphous Carbon Nitride Films Prepared by Reactive RF-Magnetron Sputtering. Japanese Journal of Applied Physics, 32(10A), L1465.

Authors 7

Noriaki Nakayama (first)
Yasuaki Tsuchiya (additional)
Satoru Tamada (additional)
Kouji Kosuge (additional)
Shinji Nagata (additional)
Katsumi Takahiro (additional)
Sadae Yamaguchi (additional)

References 18 Referenced 107

10.1080/01418638208224021 / Philos. Mag. B (1982)
10.1016/0038-1098(88)90732-6 / Solid State Commun. (1988)
10.1103/PhysRevB.39.13053 / Phys. Rev. B (1989)
10.1063/1.349043 / J. Appl. Phys. (1991)
10.1016/0038-1098(91)90295-7 / Solid State Commun. (1991)
10.1103/PhysRevB.47.10201 / Phys. Rev. B (1993)
10.1116/1.569931 / J. Vac. Sci. & Technol. (1979)
10.1557/JMR.1990.2490 / J. Mater. Res. (1990)
10.1016/0168-9002(91)90764-H / Nucl. Instrum. & Methods A (1991)
10.1016/0304-8853(93)91350-G / J. Magn. & Magn. Mater. (1993)
{'journal-title': 'J. Magn. & Magn. Mater. 126 (1993).', 'key': ''} / J. Magn. & Magn. Mater. 126 (1993).
10.1021/ja00482a021 / J. Am. Chem. Soc. (1978)
10.1007/978-1-4615-8103-1_3 (1985)
10.1103/PhysRevLett.65.1905 / Phys. Rev. Lett. (1990)
10.1103/PhysRevB.29.3428 / Phys. Rev. B (1984)
10.1103/PhysRev.146.543 / Phys. Rev. (1966)
10.1016/S0257-8972(07)80048-X / Surf. Coat. Technol. (1992)
10.1126/science.261.5119.334 / Science (1993)

Dates

Type	When
Created	20 years, 6 months ago (Feb. 22, 2005, 9:29 p.m.)
Deposited	2 years, 8 months ago (Dec. 6, 2022, 6:55 p.m.)
Indexed	2 months, 2 weeks ago (June 17, 2025, 6:08 a.m.)
Issued	31 years, 11 months ago (Oct. 1, 1993)
Published	31 years, 11 months ago (Oct. 1, 1993)
Published Print	31 years, 11 months ago (Oct. 1, 1993)

Funders 0

None

BibTeX

@article{Nakayama_1993, title={Structural Properties of Amorphous Carbon Nitride Films Prepared by Reactive RF-Magnetron Sputtering}, volume={32}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.32.l1465}, DOI={10.1143/jjap.32.l1465}, number={10A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Nakayama, Noriaki and Tsuchiya, Yasuaki and Tamada, Satoru and Kosuge, Kouji and Nagata, Shinji and Takahiro, Katsumi and Yamaguchi, Sadae}, year={1993}, month=oct, pages={L1465} }

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