DOI: 10.1143/jjap.32.l1448. NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition

10.1143/jjap.32.l1448

Crossref journal-article

IOP Publishing

Japanese Journal of Applied Physics (266)

Abstract

Thin films of MgO, NiO and CoO with NaCl-type structure were prepared by plasma-enhanced metalorganic chemical vapor deposition using metal acetylacetonato complexes as source materials. Soda-lime glass, Si(111), stainless steel and fused silica were used as the substrates. X-ray diffraction patterns indicated that (100) preferred-orientation NaCl-type oxide films were obtained at substrate temperatures of 150°C or above, independent of the kind of substrate. Scanning electron microscopy images showed that each film had a smooth surface and a columnar structure with growth perpendicular to the film surface.

Bibliography

Fujii, E., Tomozawa, A., Fujii, S., Torii, H., Masumi Hattori, M. H., & Ryoichi Takayama, R. T. (1993). NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition. Japanese Journal of Applied Physics, 32(10A), L1448.

Authors 6

Eiji Fujii (first)
Atsushi Tomozawa (additional)
Satoru Fujii (additional)
Hideo Torii (additional)
Masumi Hattori Masumi Hattori (additional)
Ryoichi Takayama Ryoichi Takayama (additional)

References 15 Referenced 60

10.1116/1.573663 / J. Vac. Sci. & Technol. (1986)
10.1016/0165-1633(84)90024-8 / Sol. Energy Mater. (1984)
10.1109/TMAG.1984.1063381 / IEEE Trans. Magn. (1984)
10.1063/1.104238 / Appl. Phys. Lett. (1990)
10.1063/1.324102 / J. Appl. Phys. (1977)
10.1143/JJAP.30.1091 / Jpn. J. Appl. Phys. (1991)
10.2109/jcersj.97.771 / J. Ceram. Soc. Jpn. (1989)
10.1103/PhysRevB.41.7961 / Phys. Rev. B (1990)
10.1063/1.107514 / Appl. Phys. Lett. (1992)
10.1117/12.962167 / Proc. SPIE (1989)
10.1063/1.101044 / Appl. Phys. Lett. (1989)
10.1007/BF00724383 / J. Mater. Sci. Lett. (1984)
10.2497/jjspm.35.197 / J. Jpn. Soc. Powder & Powder Metallurgy (1988)
{'year': '1992', 'key': ''} (1992)
10.1007/BF00324170 / Appl. Phys. A (1992)

Dates

Type	When
Created	20 years, 6 months ago (Feb. 22, 2005, 9:29 p.m.)
Deposited	2 years, 8 months ago (Dec. 6, 2022, 7:18 p.m.)
Indexed	1 month, 1 week ago (July 11, 2025, 6:37 a.m.)
Issued	31 years, 10 months ago (Oct. 1, 1993)
Published	31 years, 10 months ago (Oct. 1, 1993)
Published Print	31 years, 10 months ago (Oct. 1, 1993)

Funders 0

None

BibTeX

@article{Fujii_1993, title={NaCl-Type Oxide Films Prepared by Plasma-Enhanced Metalorganic Chemical Vapor Deposition}, volume={32}, ISSN={1347-4065}, url={http://dx.doi.org/10.1143/jjap.32.l1448}, DOI={10.1143/jjap.32.l1448}, number={10A}, journal={Japanese Journal of Applied Physics}, publisher={IOP Publishing}, author={Fujii, Eiji and Tomozawa, Atsushi and Fujii, Satoru and Torii, Hideo and Masumi Hattori, Masumi Hattori and Ryoichi Takayama, Ryoichi Takayama}, year={1993}, month=oct, pages={L1448} }

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