Crossref journal-article
IOP Publishing
Japanese Journal of Applied Physics (266)
Abstract

Dramatic lateral grain growth of nondoped poly-Si films (maximum grain size: ∼4.5 µm, film thickness: 500 Å) with strong crystallographic (111) orientation on glass substrates has been achieved using an excimer laser annealing method, namely at low temperature below 400°C and in a processing time shorter than a second, for the first time. The surface morphology of these poly-Si films was very smooth and the crystallinity was excellent with minimal internal defects. These poly-Si films have monomodally distributed grain sizes, with an average grain size of around 1.5 µm. As a result of experimental study, we speculate that the basic driving force behind this lateral grain growth was surface free energy anisotropy, as the same mechanism was observed in high-temperature furnace annealing of doped poly-Si thin films.

Bibliography

Kuriyama, H., Nohda, T., Ishida, S., Kuwahara, T., Noguchi, S., Kiyama, S., Tsuda, S., & Nakano, S. (1993). Lateral Grain Growth of Poly-Si Films with a Specific Orientation by an Excimer Laser Annealing Method. Japanese Journal of Applied Physics, 32(12S), 6190.

Authors 8
  1. Hiroyuki Kuriyama (first)
  2. Tomoyuki Nohda (additional)
  3. Satoshi Ishida (additional)
  4. Takashi Kuwahara (additional)
  5. Shigeru Noguchi (additional)
  6. Seiichi Kiyama (additional)
  7. Shinya Tsuda (additional)
  8. Shoichi Nakano (additional)
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Dates
Type When
Created 20 years, 6 months ago (Feb. 22, 2005, 9:33 p.m.)
Deposited 2 years, 8 months ago (Dec. 6, 2022, 5:39 p.m.)
Indexed 4 weeks, 1 day ago (Aug. 6, 2025, 8:40 a.m.)
Issued 31 years, 9 months ago (Dec. 1, 1993)
Published 31 years, 9 months ago (Dec. 1, 1993)
Published Print 31 years, 9 months ago (Dec. 1, 1993)
Funders 0

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